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科研机构
北京大学 [9]
西安交通大学 [2]
兰州理工大学 [1]
华南理工大学 [1]
内容类型
期刊论文 [10]
会议论文 [2]
其他 [1]
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2018 [1]
2016 [2]
2013 [3]
2011 [2]
2010 [2]
2009 [2]
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Source/Drain Engineered Charge-Plasma Junctionless Transistor for the Immune of Line Edge Roughness Effect
期刊论文
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 卷号: 65, 期号: 5, 页码: 1873-1879
作者:
Wan, Wenbo
;
Lou, Haijun
;
Xiao, Ying
;
Lin, Xinnan
收藏
  |  
浏览/下载:35/0
  |  
提交时间:2019/11/15
Charge-plasma
charge-plasma junctionless transistor (CP-JLT)
line edge roughness (LER)
variation
A Simple Method to Decompose the Amplitudes of Different Random Variation Sources in FinFET Technology
其他
2016-01-01
Jiang, Xiaobo
;
Wang, Runsheng
;
Huang, Ru
;
Wang, Xingsheng
;
Cheng, Binjie
;
Asenov, Asen
收藏
  |  
浏览/下载:1/0
  |  
提交时间:2017/12/03
LINE-EDGE ROUGHNESS
VARIABILITY
LWR
LER
A Device-Level Characterization Approach to Quantify the Impacts of Different Random Variation Sources in FinFET Technology
期刊论文
IEEE ELECTRON DEVICE LETTERS, 2016
Jiang, Xiaobo
;
Guo, Shaofeng
;
Wang, Runsheng
;
Wang, Xingsheng
;
Cheng, Binjie
;
Asenov, Asen
;
Huang, Ru
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2017/12/04
FinFET
random variation
characterization
line-edge roughness (LER)
metal gate granularity (MGG)
LINE-EDGE ROUGHNESS
VARIABILITY
LWR
LER
Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part I-Modeling and Simulation Method
期刊论文
ieee电子器件汇刊, 2013
Jiang, Xiaobo
;
Wang, Runsheng
;
Yu, Tao
;
Chen, Jiang
;
Huang, Ru
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2015/11/10
Auto-correlation function
cross-correlation
line-edge-roughness (LER)
line-width-roughness (LWR)
modeling
variability
INTRINSIC PARAMETER FLUCTUATIONS
VARIABILITY
MOSFETS
DECANANOMETER
PERFORMANCE
Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part II-Experimental Results and Impacts on Device Variability
期刊论文
ieee电子器件汇刊, 2013
Wang, Runsheng
;
Jiang, Xiaobo
;
Yu, Tao
;
Fan, Jiewen
;
Chen, Jiang
;
Pan, David Z.
;
Huang, Ru
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2015/11/10
FinFET
line-edge roughness (LER)
line-width roughness (LWR)
nanowire
variability
INTRINSIC PARAMETER FLUCTUATIONS
FINFET MATCHING PERFORMANCE
MOSFETS
DECANANOMETER
NANOWIRES
OXIDATION
NOISE
Back-Gate Bias Dependence of the Statistical Variability of FDSOI MOSFETs With Thin BOX
期刊论文
ieee电子器件汇刊, 2013
Yang, Yunxiang
;
Markov, Stanislav
;
Cheng, Binjie
;
Zain, Anis Suhaila Mohd
;
Liu, Xiaoyan
;
Asenov, Asen
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2015/11/13
Back-gate bias
line edge roughness (LER)
metal gate granularity (MGG)
random dopant fluctuation (RDF)
statistical variability (SV)
thin buried oxide (BOX)
INTRINSIC PARAMETER FLUCTUATIONS
SIMULATION
DECANANOMETER
IMPACT
Investigation on Variability in Metal-Gate Si Nanowire MOSFETs: Analysis of Variation Sources and Experimental Characterization
期刊论文
ieee电子器件汇刊, 2011
Wang, Runsheng
;
Jing Zhuge
;
Huang, Ru
;
Yu, Tao
;
Zou, Jibin
;
Kim, Dong-Won
;
Park, Donggun
;
Wang, Yangyuan
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2015/11/10
Line-edge roughness (LER)
metal-gate work function variation (WFV)
modeling
random dopant fluctuation (RDF)
Si nanowire metal-oxide-semiconductor field-effect transistor (MOSFET) (SNWT)
variability
INTRINSIC PARAMETER FLUCTUATIONS
THRESHOLD VOLTAGE FLUCTUATION
CARRIER TRANSPORT
PERFORMANCE
IMPACT
TRANSISTORS
CMOS
DECANANOMETER
INTEGRATION
MOBILITY
Variability Induced by Line Edge Roughness in Double-Gate Dopant-Segregated Schottky MOSFETs
期刊论文
ieee 纳米技术汇刊, 2011
Yang, Yunxiang
;
Yu, Shimeng
;
Zeng, Lang
;
Du, Gang
;
Kang, Jinfeng
;
Zhao, Yuning
;
Han, Ruqi
;
Liu, Xiaoyan
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2015/11/10
Dopant-segregated Schottky MOSFETs (DSS-MOSFETs)
line edge roughness (LER)
Schottky barrier (SB)
technology computer-aided design (TCAD) simulation
variations
INTRINSIC PARAMETER FLUCTUATIONS
FINFET MATCHING PERFORMANCE
BARRIER
DECANANOMETER
IMPACT
Investigation of Nanowire Line-Edge Roughness in Gate-All-Around Silicon Nanowire MOSFETs
期刊论文
ieee电子器件汇刊, 2010
Yu, Tao
;
Wang, Runsheng
;
Huang, Ru
;
Chen, Jiang
;
Zhuge, Jing
;
Wang, Yangyuan
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2015/11/10
Intrinsic parameter fluctuation
line-edge roughness (LER)
silicon nanowire MOSFET (SNWT)
variability
INTRINSIC PARAMETER FLUCTUATIONS
FINFET MATCHING PERFORMANCE
CARRIER TRANSPORT
CMOS TECHNOLOGY
IMPACT
TRANSISTORS
DEVICES
DECANANOMETER
VARIABILITY
INTEGRATION
Characterization of sidewall roughness for silicon microstructures in micro actuator
期刊论文
INTERNATIONAL JOURNAL OF APPLIED ELECTROMAGNETICS AND MECHANICS, 2010, 卷号: 33, 期号: [db:dc_citation_issue], 页码: 985-990
作者:
Han, Guoqiang
;
Jiang, Zhuangde
;
Jing, Weixuan
;
Gao, Jianzhong
;
Prewett, Philip D.
收藏
  |  
浏览/下载:1/0
  |  
提交时间:2019/12/10
line edge roughness (LER)
Micro actuator
deep reactive ion etching (DRIE)
scanning electron microscope (SEM)
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