CORC

在结果中检索

CORC

浏览/检索结果: 共126条，第1-10条 帮助

已选(0)清除 条数/页：   排序方式：
Applying the plasma physical sputtering process to SRF cavity treatment: Simulation and Experiment Study 期刊论文
APPLIED SURFACE SCIENCE, 2022, 卷号: 574, 页码: 10
作者:  Zhu, Tongtong;  Luo, Didi;  Wu, Andong;  Tan, Teng;  Guo, Hao
收藏  |  浏览/下载：79/0  |  提交时间：2022/01/12
Highly Textured Assembly of Engineered Si Nanowires for Artificial Synapses Model 期刊论文
ACS APPLIED ELECTRONIC MATERIALS, 2021, 卷号: 3, 期号: 3, 页码: 1375-1383
作者:  Duan, Chunyang;  Zhao, Dong;  Wang, Xiang;  Ren, Bei;  Li, Mengqi
收藏  |  浏览/下载：23/0  |  提交时间：2021/08/31
Scanning ion beam etching: A method for the fabrication of computer-generated hologram with nanometric accuracy for aspherical testing 期刊论文
Optics and Lasers in Engineering, 2021, 卷号: 139
作者:  R. Wang;  Z. Zhang;  Y. Bai;  Y. Wang;  X. Yin
收藏  |  浏览/下载：3/0  |  提交时间：2022/06/13
Improved etching uniformity using equivalent electrodes on an unconventional, irregular membrane optical element for large aperture diffractive optical telescopes 期刊论文
Optics Express, 2020, 卷号: 28, 期号: 22, 页码: 33739-33746
作者:  Zhang, Jingwen;  Li, Zhiwei;  Shao, Junming;  Liu, Dun;  Fan, Bin
收藏  |  浏览/下载：17/0  |  提交时间：2021/05/11
Improved etching uniformity using equivalent electrodes on an unconventional, irregular membrane optical element for large aperture diffractive optical telescopes 会议论文
作者:  Zhang, Jingwen;  Li, Zhiwei;  Shao, Junming;  Liu, Dun;  Fan, Bin
收藏  |  浏览/下载：2/0  |  提交时间：2020/12/18
Improved etching uniformity using equivalent electrodes on an unconventional, irregular membrane optical element for large aperture diffractive optical telescopes 期刊论文
Optics Express, 2020, 卷号: 28, 期号: 22, 页码: 33739-33746
作者:  Zhang, Jingwen;  Li, Zhiwei;  Shao, Junming;  Liu, Dun;  Fan, Bin
收藏  |  浏览/下载：13/0  |  提交时间：2020/12/18
Improvement of GaN plasma etching uniformity by optimizing the coil electrode with plasma simulation and experimental validation 期刊论文
SURFACE & COATINGS TECHNOLOGY, 2020, 卷号: 400
作者:  Xiao, Dezhi;  Ruan, Qingdong;  Liu, Liangliang;  Shen, Jie;  Cheng, Cheng
收藏  |  浏览/下载：22/0  |  提交时间：2020/11/26
Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates 期刊论文
JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267
作者:  Zhang JW(张景文)
收藏  |  浏览/下载：11/0  |  提交时间：2020/11/30
Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates 期刊论文
JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267
作者:  Zhang, Jingwen;  Fan, Bin;  Li, Zhiwei;  Gao, Guohan;  Li, Bincheng
收藏  |  浏览/下载：28/0  |  提交时间：2021/05/11
Fabrication of random microlens array for laser beam homogenization with high efficiency 期刊论文
Micromachines, 2020, 卷号: 11, 期号: 3
作者:  Xue, Li;  Pang, Yingfei;  Liu, Wenjing;  Liu, Liwei;  Pang, Hui
收藏  |  浏览/下载：21/0  |  提交时间：2021/05/11

©版权所有 ©2017 CSpace - Powered by CSpace