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Critical-dimension scanning electron microscope characterization of smoothly varying wave structures with a Monte Carlo simulation 期刊论文
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2021, 卷号: 54
作者:  Khan, M. S. S.;  Yang, L. H.;  Deng, X.;  Mao, S. F.;  Zou, Y. B.
收藏  |  浏览/下载：68/0  |  提交时间：2021/09/06
Influence of Template Modulus of Elasticity on Polymer Filling, Deformation and Stress Distribution 期刊论文
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2018, 卷号: 31, 期号: 1, 页码: 19-26
作者:  Wang, Qing;  Zhang, Yanju;  Zheng, Xu;  Ma, Lijun;  Zhang, Rui
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/11
Large-scale SiO_2 photonic crystal for high efficiency GaN LEDs by nanospherical-lens lithography 期刊论文
2016, 2016
吴奎; 魏同波; 蓝鼎; 郑海洋; 王军喜; 罗毅; 李晋闽; Wu Kui; Wei Tong-Bo; Lan Ding; Zheng Hai-Yang; Wang Jun-Xi; Luo Yi; Li Jin-Min
收藏  |  浏览/下载：5/0
Numerical Aperture and Partial Coherence Optimization in Optical Lithography under Off-axis Illumination 会议论文
International Conference on Manufacturing Science and Technology (ICMST 2011), SEP 16-18, 2011
作者:  Guo, Liping;  Fu, Shenggui;  Liu, Xiaojuan
收藏  |  浏览/下载：6/0  |  提交时间：2019/12/31
银纳米粒子的制备与分子修饰及其消光光谱研究 学位论文
2011, 2010
张瑜娟
收藏  |  浏览/下载：2/0  |  提交时间：2016/02/14
Analysis of measuring errors for the visible light phase-shifting point diffraction interferometer (EI CONFERENCE) 会议论文
2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010, December 3, 2010 - December 6, 2010, Guangzhou, China
Zhang Y.; Jin C.; Lu Z.
收藏  |  浏览/下载：10/0  |  提交时间：2013/03/25
In order to improve the measuring accuracy of the visible light phase-shifting point diffraction interferometer (PS/PDI) for the extreme ultraviolet lithography (EUVL) aspheric mirrors  the main measuring errors will be discussed in this paper. At first  the elementary configuration and measuring principle of the visible light phase-shifting point diffraction interferometer are introduced briefly  then the different errors which are possible to affect the measuring result are summed up  the errors include PZT phase-shifting error  detector nonlinearity error  detector quantization error  wavelength instability error and intensity instability error of the laser source  vibration error  air refractivity instability error and so on. Through detailed analysis and simulation  the magnitude of these errors can be obtained. By analysing the reasons which cause these errors and the relationship between these errors and interferometer configuration parameters  some methods are put forward to avoid or restrain these errors accordingly.  
A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory (EI CONFERENCE) 会议论文
6th International Symposium on Precision Engineering Measurements and Instrumentation, August 8, 2010 - August 11, 2010, Hangzhou, China
Zhao Y.; Gong Y.; Li S.; Zhang W.
收藏  |  浏览/下载：16/0  |  提交时间：2013/03/25
Off-axis illumination (OAI) technology is widely used to enhance resolution for deep ultraviolet lithography. The realizing methods of OAI include geometrical optics method and physical optics method. However  the former has the disadvantage of weak intensity distribution controlling ability  and the latter introduces simulation errors evidently when dealing with near field diffraction propagation. A diffractive optical element (DOE) designing method using plane wave angular spectrum theory is presented in this paper. Several kinds of OAI modes at near field away from DOE can be realized  and simulation errors and the size of illuminator are also reduced. According to studying the relationships of the sampling point distance of DOE  light beam propagation distance  and the structure of the beam shaping unit  a method of determining the designing parameters is discussed. Using this method  several illumination modes are realized  and simulation results show that all diffraction efficiencies reach up to 84%. The method of DOE manufacturing is analyzed at last  and it is proven to be feasible. 2010 SPIE.  
Simulation and experimental study on photoresist flow and deforming behavior in imprint lithography process 期刊论文
Jixie Gongcheng Xuebao/Journal of Mechanical Engineering, 2010, 卷号: 46, 期号: [db:dc_citation_issue], 页码: 165-171
作者:  Wang, Quandai;  Duan, Yugang;  Lu, Bingheng;  Li, Dichen;  Xiang, Jiawei
收藏  |  浏览/下载：1/0  |  提交时间：2019/12/10
Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method 期刊论文
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 卷号: 8, 期号: 3, 页码: 13
作者:  Zong, Ke;  Zeng, Xuan;  Ji, Xia;  Cai, Wei
收藏  |  浏览/下载：15/0  |  提交时间：2018/07/30
Study of the contour-based optical proximity correction methodology 期刊论文
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 卷号: 8, 期号: 4, 页码: 43005-43005
Zhu, L; Kang, XH; Gu, YL; Yang, S
收藏  |  浏览/下载：21/0  |  提交时间：2012/03/24

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