Study of the contour-based optical proximity correction methodology | |
Zhu, L ; Kang, XH ; Gu, YL ; Yang, S | |
刊名 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
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2009 | |
卷号 | 8期号:4页码:43005-43005 |
关键词 | LITHOGRAPHY OPC SIMULATION DESIGN |
ISSN号 | 1537-1646 |
通讯作者 | Zhu, L, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China |
学科主题 | Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Optics |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2012-03-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.sim.ac.cn/handle/331004/94894] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Zhu, L,Kang, XH,Gu, YL,et al. Study of the contour-based optical proximity correction methodology[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,2009,8(4):43005-43005. |
APA | Zhu, L,Kang, XH,Gu, YL,&Yang, S.(2009).Study of the contour-based optical proximity correction methodology.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,8(4),43005-43005. |
MLA | Zhu, L,et al."Study of the contour-based optical proximity correction methodology".JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 8.4(2009):43005-43005. |
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