Study of the contour-based optical proximity correction methodology

	Study of the contour-based optical proximity correction methodology
	Zhu, L ; Kang, XH ; Gu, YL ; Yang, S
刊名	JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
	2009
卷号	8 期号:4 页码:43005-43005
关键词	LITHOGRAPHY OPC SIMULATION DESIGN
ISSN号	1537-1646
通讯作者	Zhu, L, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
学科主题	Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Optics
收录类别	SCI
语种	英语
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/94894]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Zhu, L,Kang, XH,Gu, YL,et al. Study of the contour-based optical proximity correction methodology[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,2009,8(4):43005-43005.
APA	Zhu, L,Kang, XH,Gu, YL,&Yang, S.(2009).Study of the contour-based optical proximity correction methodology.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,8(4),43005-43005.
MLA	Zhu, L,et al."Study of the contour-based optical proximity correction methodology".JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 8.4(2009):43005-43005.