Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method
Zong, Ke1; Zeng, Xuan1; Ji, Xia2; Cai, Wei3
刊名JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
2009-07-01
卷号8期号:3页码:13
关键词lithography simulation phase-shifting mask spectral method eigen oscillations discontinuous Galerkin method Schwarz domain decomposition iteration
ISSN号1537-1646
DOI10.1117/1.3158611
英文摘要We apply a newly developed parallel generalized eigen-oscillation spectral element method (GeSEM) for rigorous simulations of 2-D phase-shift masks (PSMs). The GeSEM combines highly parallel Schwarz-domain decomposition iterations and an eigen-oscillation-based spectral method to model high-frequency oscillatory electromagnetic fields in PSMs with dispersive chrome materials in the PSMs. The performance of the GeSEM has been compared to the popular plane wave-based waveguide method for 2-D masks. The numerical results have clearly demonstrated the GeSEM's advantages in modeling the effects of nonperiodic structures such as optical images near mask edges, and its speedup through parallel implementations, which makes the simulation of a large-scale mask possible in whole-chip mask modeling. (C) 2009 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3158611]
资助项目National Basic Research Program of China[2005CB321701] ; National Major Science and Technology[2008ZX01035-001-06] ; National Major Science and Technology[2009ZX020234-3] ; NSFC[60676018] ; NSFC[60806013] ; Ministry of Education of China[200802460068] ; International Science and Technology Cooperation program foundation of Shanghai[08510700100] ; Outstanding Academic Leader of Shanghai ; DARPA[W911NF-05-2-0053] ; State Key laboratory of Scientific and Engineering Computing ; Chinese Academy of Sciences ; U. S. Department of Energy[DEFG0205ER25678]
WOS研究方向Engineering ; Science & Technology - Other Topics ; Materials Science ; Optics
语种英语
出版者SPIE-SOC PHOTOPTICAL INSTRUMENTATION ENGINEERS
WOS记录号WOS:000270881800014
内容类型期刊论文
源URL[http://ir.amss.ac.cn/handle/2S8OKBNM/7512]  
专题中国科学院数学与系统科学研究院
通讯作者Zong, Ke
作者单位1.Fudan Univ, State Key Lab ASIC & Syst, Microelect Dept, Shanghai 201203, Peoples R China
2.Chinese Acad Sci, Inst Computat Math, Beijing 100190, Peoples R China
3.Univ N Carolina, Dept Math & Stat, Charlotte, NC 28223 USA
推荐引用方式
GB/T 7714
Zong, Ke,Zeng, Xuan,Ji, Xia,et al. Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,2009,8(3):13.
APA Zong, Ke,Zeng, Xuan,Ji, Xia,&Cai, Wei.(2009).Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,8(3),13.
MLA Zong, Ke,et al."Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method".JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 8.3(2009):13.
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