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| 氮化硅干法刻蚀工艺设备模型的试验与测量 期刊论文
2010, 2010
李煜; 李瑞伟; 王纪民; 付玉霞; LI Yu; LI Rui-wei; WANG Ji-min; FU Yu-xia
  收藏 | 浏览/下载：2/0 |
| 感应耦合等离子体刻蚀机二维放电模拟 期刊论文
2010, 2010
程嘉; 朱煜; 汪劲松; Cheng Jia; Zhu Yu; Wang Jinsong
收藏 | 浏览/下载：3/0 |
| Influence of configurations of chamber and coil on uniformity of plasma distribution for inductively coupled plasma etcher 会议论文
International Technology and Innovation Conference 2006. ITIC 2006, International Technology and Innovation Conference 2006. ITIC 2006, Hangzhou, China, INSPEC
Cheng Jia; Zhu Yu
收藏 | 浏览/下载：6/0 |
| An experiment on process equipment model for Si/sub 3/N/sub 4 / dry etching 期刊论文
2010, 2010
Li Yu; Li Rui-wei; Wang Ji-min; Fu Yu-xia
收藏 | 浏览/下载：3/0 |
| Silicon vertical interconnect technology of low cost 期刊论文
2010, 2010
Feng Guo-qiang; Cai Jian; Wang Shui-di; Jia Song-liang
收藏 | 浏览/下载：6/0 |
| Improvement on GaN-based LED reversed leakage current characteristic by passivation process 期刊论文
2010, 2010
Xue Song; Han Yan-jun; Luo Yi
收藏 | 浏览/下载：3/0 |
| Cut-Process Overlay Yield Model for Self-aligned Multiple Patterning and a Misalignment Correction Technique Based on Dry Etching (CPCI-S收录) 会议论文
ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING II
作者: Zhang, Pan[1]; Chen, Yijian[1]
收藏 | 浏览/下载：1/0 | 提交时间：2019/04/15
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