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浏览/检索结果: 共2条，第1-2条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Characterization and attenuation mechanism of CMOS-compatible micromachined edge-suspended coplanar waveguides on low-resistivity silicon substrate 期刊论文 2006 Leung, Lydia L. W.; Hon, Wai-Cheong; Zhang, Jinwen; Chen, Kevin J. 收藏  |  浏览/下载：3/0  |  提交时间：2015/11/16 current crowding  edge-suspended coplanar waveguide (CPW)  inductively coupled plasma deep reactive ion etching (ICP-DRIE)  micromachining  proximity effect  tetramethyl ammonium hydroxide (TMAH) anisotropic silicon etching  LINES  INTERCONNECTS  COMPONENTS  INDUCTORS   CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies 期刊论文 ieee electron device letters, 2004 Chen, KJ; Hon, WC; Zhang, JW; Leung, LLW 收藏  |  浏览/下载：3/0  |  提交时间：2015/11/12 current crowding  edge-suspended inductors  ICP-DRIE etching  micromachining  proximity effect  tetramethyl ammonium hydroxide (TMAH) anisotropic silicon etching  SILICON  COPPER  TECHNOLOGY