CMOS-compatible micromachined edge-suspended spiral inductors with high   Q-factors and self-resonance frequencies

doi:10.1109/LED.2004.829004

CORC > 北京大学 > 信息科学技术学院

	CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies
	Chen, KJ ; Hon, WC ; Zhang, JW ; Leung, LLW
刊名	ieee electron device letters
	2004
关键词	current crowding edge-suspended inductors ICP-DRIE etching micromachining proximity effect tetramethyl ammonium hydroxide (TMAH) anisotropic silicon etching SILICON COPPER TECHNOLOGY
DOI	10.1109/LED.2004.829004
英文摘要	This paper reports a new category of high-Q edge-suspended inductors (ESI) that are fabricated using CMOS-compatible micromachining techniques. This structure was designed based on the concept that the current was crowded at the edges of the conducting metal wires at high frequencies due to the proximity effect. The substrate coupling and loss can be effectively suppressed by removing the silicon around and underneath the edges of the signal lines. Different from the conventional air-suspended inductors that have the inductors built on membranes or totally suspended in the air, the edge-suspended structures have the silicon underneath the center of the metal lines as the strong mechanical supports. The ESIs are fabricated using a combination of deep dry etching and anisotropic wet etching techniques that are compatible with CMOS process. For a three-turn 4.5-nH inductor, a 70% increase (from 6.8 to 11.7) in maximum Q-factor and a 57% increase (from 9.1 to 14.3 GHz) in self-resonance frequency were obtained with a 11-mum suspended edge in 25-mum-wide lines.; Engineering, Electrical & Electronic; SCI(E); EI; 14; ARTICLE; 6; 363-365; 25
语种	英语
内容类型	期刊论文
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/254553]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Chen, KJ,Hon, WC,Zhang, JW,et al. CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies[J]. ieee electron device letters,2004.
APA	Chen, KJ,Hon, WC,Zhang, JW,&Leung, LLW.(2004).CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies.ieee electron device letters.
MLA	Chen, KJ,et al."CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies".ieee electron device letters (2004).