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CORC

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Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device 期刊论文
Journal of Alloys and Compounds, 2019, 页码: 543-549
作者:  Ma, Pengfei;  Sun, Jiamin;  Zhang, Guanqun;  Liang, Guangda;  Xin, Qian
收藏  |  浏览/下载：6/0  |  提交时间：2019/12/11
Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 792, 页码: 543-549
作者:  Ma, Pengfei;  Sun, Jiamin;  Zhang, Guanqun;  Liang, Guangda;  Xin, Qian
收藏  |  浏览/下载：14/0  |  提交时间：2019/12/11
Interface chemistry and electronic structure of ALD-derived HfAlO/Ge gate stacks revealed by X-ray photoelectron spectroscopy 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 716, 期号: 无, 页码: 1-6
作者:  He, Gang;  Jiang, Shanshan;  Li, Wendong;  Zheng, Changyong;  He, Huaxin
收藏  |  浏览/下载：38/0  |  提交时间：2018/05/25
Modulation of interfacial and electrical properties of ALD-derived HfAlO/Al2O3/Si gate stack by annealing temperature 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 691, 期号: 无, 页码: 504-513
作者:  Gao, J.;  He, G.;  Liu, M.;  Lv, J. G.;  Sun, Z. Q.
收藏  |  浏览/下载：18/0  |  提交时间：2017/11/21
Band Offsets and Interfacial Properties of HfAlO Gate Dielectric Grown on InP by Atomic Layer Deposition 期刊论文
NANOSCALE RESEARCH LETTERS, 2017, 卷号: 12, 页码: -
作者:  Yang, LF;  Wang, T;  Zou, Y;  Lu, HL
收藏  |  浏览/下载：17/0  |  提交时间：2017/12/08
Annealing Temperature Dependent Electrical Properties and Leakage Current Transport Mechanisms in Atomic Layer Deposition-Derived Al2O3-Incorporated HfO2/Si Gate Stack 期刊论文
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2016, 卷号: 16, 期号: 8, 页码: 8075-8082
作者:  Gao, Juan;  He, Gang;  Zhang, Jiwen;  Chen, Xuefei;  Jin, Peng
收藏  |  浏览/下载：22/0  |  提交时间：2017/11/21
Modification of electrical properties and carrier transportation mechanism of ALD-derived HfO2/Si gate stacks by Al2O3 incorporation 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2016, 卷号: 667, 期号: 无, 页码: 352-358
作者:  Gao, Juan;  He, Gang;  Sun, Zhaoqi;  Chen, Hanshuang;  Zheng, Changyong
收藏  |  浏览/下载：20/0  |  提交时间：2017/10/18
Interfacial and electrical properties of HfAlO/GaSb metal-oxide-semiconductor capacitors with sulfur passivation 期刊论文
2016, 2016
谭桢; 赵连锋; 王敬; 许军; Tan Zhen; Zhao Lian-Feng; Wang Jing; Xu Jun
收藏  |  浏览/下载：8/0
Two-bit memory and quantized storage phenomenon in conventional MOS structures with double-stacked Pt-NCs in an HfAlO matrix 期刊论文
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2016, 卷号: 18, 期号: 9, 页码: 6509-6514
作者:  Zhou, Guangdong;  Wu, Bo;  Liu, Xiaoqin;  Li, Ping;  Zhang, Shuangju
收藏  |  浏览/下载：20/0  |  提交时间：2016/06/27
Self-organized Ge nanocrystals embedded in HfAlO fabricated by pulsed-laser deposition and application to floating gate memory 期刊论文
APPLIED PHYSICS LETTERS, 2005, 卷号: 86, 期号: 1, 页码: 13110-13110
Liu, WL; Lee, PF; Dai, JY; Wang, J; Chan, HLW; Choy, CL; Song, ZT; Feng, SL
收藏  |  浏览/下载：14/0  |  提交时间：2012/03/24

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