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Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part I-Modeling and Simulation Method 期刊论文
ieee电子器件汇刊, 2013
Jiang, Xiaobo; Wang, Runsheng; Yu, Tao; Chen, Jiang; Huang, Ru
收藏  |  浏览/下载:11/0  |  提交时间:2015/11/10
Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part II-Experimental Results and Impacts on Device Variability 期刊论文
ieee电子器件汇刊, 2013
Wang, Runsheng; Jiang, Xiaobo; Yu, Tao; Fan, Jiewen; Chen, Jiang; Pan, David Z.; Huang, Ru
收藏  |  浏览/下载:7/0  |  提交时间:2015/11/10
Back-Gate Bias Dependence of the Statistical Variability of FDSOI MOSFETs With Thin BOX 期刊论文
ieee电子器件汇刊, 2013
Yang, Yunxiang; Markov, Stanislav; Cheng, Binjie; Zain, Anis Suhaila Mohd; Liu, Xiaoyan; Asenov, Asen
收藏  |  浏览/下载:4/0  |  提交时间:2015/11/13
Simulation of correlated line-edge roughness in multi-gate devices 其他
2013-01-01
Jiang, Xiaobo; Wang, Runsheng; Huang, Ru; Chen, Jiang
收藏  |  浏览/下载:4/0  |  提交时间:2015/11/13


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