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长春光学精密机械与物... [1]
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会议论文 [1]
发表日期
2009 [1]
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Design and tolerance analysis of compensator for high order aspheric surface testing (EI CONFERENCE)
会议论文
2009 International Conference on Optical Instruments and Technology - Optoelectronic Measurement Technology and Systems, October 19, 2009 - October 22, 2009, Shanghai, China
Chen X.
;
Liu W.
;
Kang Y.
;
Wei Z.
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提交时间:2013/03/25
High accuracy is required in surface testing of 90nm nodal point lithography projecting lens. By comparing various aspheric surface testing methods
the structure layout of the compensator is a meniscus positive lens combined with a Plano-convex positive lens. The design results indicate that: primary and high order aberrations are balanced well
we adopt Offner null compensator to test the aspheric surface in the point diffraction interferometer at last. In this paper
MTF exceeds diffraction limit
an Offner compensator is presented on the base of the third order aberration theory to test concave aspheric surface
root-mean-square (RMS) of wave front error /167. The F-number of the system can achieve F/1.64. By the analysis of the process of aspheric surface testing with the designed system
the optical construction parameters of which is determined by introducing equal-quantities spherical aberration to compensate all orders of aspheric coefficients. The field of view of the system is 0.02
a loosen distribution of the tolerance was presented based on the accuracy of measuring apparatus. 2009 SPIE.
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