QQ客服 官方微博 反馈留言

	Design and tolerance analysis of compensator for high order aspheric surface testing (EI CONFERENCE)
	Chen X. ; Liu W. ; Kang Y. ; Wei Z.
	2009
会议名称	2009 International Conference on Optical Instruments and Technology - Optoelectronic Measurement Technology and Systems, October 19, 2009 - October 22, 2009
会议地点	Shanghai, China
关键词	High accuracy is required in surface testing of 90nm nodal point lithography projecting lens. By comparing various aspheric surface testing methods the structure layout of the compensator is a meniscus positive lens combined with a Plano-convex positive lens. The design results indicate that: primary and high order aberrations are balanced well we adopt Offner null compensator to test the aspheric surface in the point diffraction interferometer at last. In this paper MTF exceeds diffraction limit an Offner compensator is presented on the base of the third order aberration theory to test concave aspheric surface root-mean-square (RMS) of wave front error /167. The F-number of the system can achieve F/1.64. By the analysis of the process of aspheric surface testing with the designed system the optical construction parameters of which is determined by introducing equal-quantities spherical aberration to compensate all orders of aspheric coefficients. The field of view of the system is 0.02 a loosen distribution of the tolerance was presented based on the accuracy of measuring apparatus. 2009 SPIE.
收录类别	EI
内容类型	会议论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/33698]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Chen X.,Liu W.,Kang Y.,et al. Design and tolerance analysis of compensator for high order aspheric surface testing (EI CONFERENCE)[C]. 见:2009 International Conference on Optical Instruments and Technology - Optoelectronic Measurement Technology and Systems, October 19, 2009 - October 22, 2009. Shanghai, China.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。