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Achieving surface-sealing of hematite nanoarray photoanode with controllable metal–organic frameworks shell for enhanced photoelectrochemical water oxidation
期刊论文
Journal of Catalysis, 2022, 卷号: 413, 页码: 398-406
作者:
Wang, Peng
;
Wang, Shuyan
;
Gao, Lili
;
Long, Xuefeng
;
Chai, Huan
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2022/08/09
Binary alloys
Carrier lifetime
Charge transfer
Crystalline materials
Crystallinity
Electrocatalysis
Etching
Metals
Organometallics
Oxidation
Photocatalytic activity
Photoelectrochemical cells
Shells (structures)
Core shell structure
Haematite
Layered-double hydroxides
Metalorganic frameworks (MOFs)
Nanoarrays
Photo-anodes
Photoelectrochemical water oxidation
Photoelectrochemicals
Surface engineering
Surface sealing
Microcystin-LR degradation by hydrogen-terminated porous Si under visible light irradiation
期刊论文
DESALINATION AND WATER TREATMENT, 2017, 卷号: 59, 页码: 280-286
作者:
Xu, Hangzhou
;
Pei, Haiyan
;
Xiao, Hongdi
;
Hu, Wenrong
;
Cao, Dezhong
收藏
  |  
浏览/下载:2/0
  |  
提交时间:2019/12/11
Photo-electrochemical etching
H-PSi wafer
Microcystin-LR
Water
treatment
Photodegradation activity and stability of porous silicon wafers with (100) and (111) oriented crystal planes
期刊论文
MICROPOROUS AND MESOPOROUS MATERIALS, 2015, 卷号: 204, 期号: C, 页码: 251-256
作者:
Xu, Hangzhou
;
Xiao, Hongdi
;
Pei, Haiyan
;
Cui, Jishi
;
Hu, Wenrong
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2019/12/17
Photo-electrochemical process
Porous silicon
Anisotropic etching
Photodegradation
Photodegradation activity and stability of porous silicon wafers with (100) and (111) oriented crystal planes
期刊论文
Microporous and mesoporous materials: The offical journal of the International Zeolite Association, 2015, 页码: 251-256
作者:
Xu, Hangzhou
;
Xiao, Hongdi
;
Pei, Haiyan
;
Cui, Jishi
;
Hu, Wenrong
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2019/12/17
Photo-electrochemical process
Porous silicon
Anisotropic etching
Photodegradation
光诱导约束刻蚀体系中羟基自由基生成的影响因素
期刊论文
2013
胡艳
;
方秋艳
;
周剑章
;
詹东平
;
时康
;
田中群
;
田昭武
收藏
  |  
浏览/下载:62/0
  |  
提交时间:2016/05/17
光诱导约束刻蚀
游离·OH
荧光检测
光电协同效应
TiO2纳米管阵列
Photo-induced confined etching
Free OH
Fluorescence detection
Photo-electro-synergistic effect
TiO2nanotube array
Hierarchical Porous Patterns of n-type 6H-SiC Crystals via Photoelectrochemical Etching
期刊论文
Journal of Materials Science & Technology, 2013, 期号: 07, 页码: 655-661
作者:
Lihuan Wang
;
Huihui Shao
;
Xiaobo Hu
;
Xiangang Xu
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  |  
浏览/下载:3/0
  |  
提交时间:2019/12/23
SiC
Photo-electrochemical etching
Porous patterning
Hierarchical Porous Patterns of n-type 6H-SiC Crystals via Photo-electrochemical Etching
期刊论文
材料科学技术学报, 2013, 卷号: 29, 期号: 7, 页码: 655-661
作者:
Wang, Lihuan
;
Shao, Huihui
;
Hu, Xiaobo
;
Xu, Xiangang
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  |  
浏览/下载:3/0
  |  
提交时间:2019/12/23
SiC
Photo-electrochemical etching
Porous patterning
Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE)
会议论文
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.
收藏
  |  
浏览/下载:21/0
  |  
提交时间:2013/03/25
In ultraviolet spectroscopy
groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore
there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order
it is important to control the groove shape precisely
so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm
especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method
the required blaze angle is small
we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles
and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model
the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides
since the etched groove shape depends on the aspect ratio of the photoresist mask ridge
if we wish to fabricate larger gratings with this method
we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
The photo-induced cathodal protection of 304SS with graded bandgap ferrite/TiO/sub 2/ nanostructures
期刊论文
2010, 2010
Yunhan Ling
;
Zhihong Guo
;
Hongyi Li
;
Wufeng Jiang
;
Xinde Bai
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  |  
浏览/下载:5/0
Synthesis of carbon nitride powder by selective etching of TiC0.3N0.7 in chlorine-containing atmosphere at moderate temperature
期刊论文
Materials Chemistry and Physics, 2010, 卷号: 123, 页码: 264-268
作者:
Lv JJ(吕晋军)
;
Lv JJ(吕晋军)
收藏
  |  
浏览/下载:15/0
  |  
提交时间:2012/09/28
Nitride
Etching
Fourier transform infrared spectroscopy
(FTIR)
X-ray photo-emission spectroscopy (XPS)
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