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北京大学 [27]
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Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm
期刊论文
Nanoscale, 2020, 卷号: 12, 期号: 4, 页码: 2415-2421
作者:
Gao, Ping
;
Pu, Mingbo
;
Ma, Xiaoliang
;
Li, Xiong
;
Guo, Yinghui
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2021/05/11
Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
期刊论文
MACROMOLECULAR MATERIALS AND ENGINEERING, 2018, 卷号: 303, 期号: 6
作者:
Peng, Xiaoman
;
Wang, Yafei
;
Xu, Jian
;
Yuan, Hua
;
Wang, Liangqian
收藏
  |  
浏览/下载:35/0
  |  
提交时间:2019/04/09
Euv
Lithography
Molecular Glasses
Photoresists
Source/Drain Engineered Charge-Plasma Junctionless Transistor for the Immune of Line Edge Roughness Effect
期刊论文
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 卷号: 65, 期号: 5, 页码: 1873-1879
作者:
Wan, Wenbo
;
Lou, Haijun
;
Xiao, Ying
;
Lin, Xinnan
收藏
  |  
浏览/下载:34/0
  |  
提交时间:2019/11/15
Charge-plasma
charge-plasma junctionless transistor (CP-JLT)
line edge roughness (LER)
variation
The immunity of doping-less junctionless transistor variations including the line edge roughness
会议论文
Hong Kong, Hong kong, August 3, 2016 - August 5, 2016
作者:
Wan, Wenbo
;
Lou, Haijun
;
Xiao, Ying
;
Lin, Xinnan
收藏
  |  
浏览/下载:24/0
  |  
提交时间:2020/11/15
Etching
Semiconductor doping
Transistors
Charge plasmas
Electrical characteristic
Etching process
Junctionless
Junctionless transistors
Line Edge Roughness
ON/OFF current ratio
variation
A Simple Method to Decompose the Amplitudes of Different Random Variation Sources in FinFET Technology
其他
2016-01-01
Jiang, Xiaobo
;
Wang, Runsheng
;
Huang, Ru
;
Wang, Xingsheng
;
Cheng, Binjie
;
Asenov, Asen
收藏
  |  
浏览/下载:1/0
  |  
提交时间:2017/12/03
LINE-EDGE ROUGHNESS
VARIABILITY
LWR
LER
A Device-Level Characterization Approach to Quantify the Impacts of Different Random Variation Sources in FinFET Technology
期刊论文
IEEE ELECTRON DEVICE LETTERS, 2016
Jiang, Xiaobo
;
Guo, Shaofeng
;
Wang, Runsheng
;
Wang, Xingsheng
;
Cheng, Binjie
;
Asenov, Asen
;
Huang, Ru
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2017/12/04
FinFET
random variation
characterization
line-edge roughness (LER)
metal gate granularity (MGG)
LINE-EDGE ROUGHNESS
VARIABILITY
LWR
LER
The Immunity of Doping-less Junctionless Transistor Variations Including the Line Edge Roughness
会议论文
作者:
Wan, Wenbo
;
Lou, Haijun
;
Xiao, Ying
;
Lin, Xinnan
收藏
  |  
浏览/下载:14/0
  |  
提交时间:2019/11/15
charge-plasma
Junctionless
LER
variation
Line-edge roughness induced single event transient variation in SOI FinFETs
期刊论文
半导体学报(英文版), 2015
Wu Weikang
;
An Xia
;
Jiang Xiaobo
;
Chen Yehua
;
Liu Jingjing
;
Zhang Xing
;
Huang Ru
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2017/12/03
heavy ion irradiation single event transient variation line-edge roughness SOI FinFET
heavy ion irradiation
single event transient
variation
line-edge roughness
SOI
FinFET
Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part I-Modeling and Simulation Method
期刊论文
ieee电子器件汇刊, 2013
Jiang, Xiaobo
;
Wang, Runsheng
;
Yu, Tao
;
Chen, Jiang
;
Huang, Ru
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2015/11/10
Auto-correlation function
cross-correlation
line-edge-roughness (LER)
line-width-roughness (LWR)
modeling
variability
INTRINSIC PARAMETER FLUCTUATIONS
VARIABILITY
MOSFETS
DECANANOMETER
PERFORMANCE
Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part II-Experimental Results and Impacts on Device Variability
期刊论文
ieee电子器件汇刊, 2013
Wang, Runsheng
;
Jiang, Xiaobo
;
Yu, Tao
;
Fan, Jiewen
;
Chen, Jiang
;
Pan, David Z.
;
Huang, Ru
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2015/11/10
FinFET
line-edge roughness (LER)
line-width roughness (LWR)
nanowire
variability
INTRINSIC PARAMETER FLUCTUATIONS
FINFET MATCHING PERFORMANCE
MOSFETS
DECANANOMETER
NANOWIRES
OXIDATION
NOISE
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