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Cooling rate dependence of Ni-catalyzed transformation of amorphous carbon into graphene in rapid thermal processing: An experimental and reactive molecular dynamics study 期刊论文
APPLIED SURFACE SCIENCE, 2020, 卷号: 529
作者:  Li, Xiaowei;  Li, Hanchao;  Lee, Kwang-Ryeol;  Wang, Aiying
收藏  |  浏览/下载:106/0  |  提交时间:2020/12/16
Large piezoelectricity on Si from highly -oriented PZT thick films via a CMOS-compatible sputtering/RTP process 期刊论文
Materialia, 2019, 卷号: Vol.5, 页码: 100228
作者:  Yingying Wang;  Hongbo Cheng;  Jing Yan;  Ning Chen;  Peng Yan
收藏  |  浏览/下载:11/0  |  提交时间:2019/12/17
Large piezoelectricity on Si from highly (001)-oriented PZT thick films via a CMOS-compatible sputtering/RTP process 期刊论文
Materialia, 2019, 卷号: 5
作者:  Wang Y.;  Cheng H.;  Yan J.;  Chen N.;  Yan P.
收藏  |  浏览/下载:19/0  |  提交时间:2019/12/11
Improvement of the photovoltaic performance of Ag-alloyed Cu2ZnSn(S,Se)(4)-based solar cells by optimizing the selenization temperature 期刊论文
Superlattices and Microstructures, 2019, 卷号: 125, 页码: 287-294
作者:  X.L.Zhai;  B.Yao;  Y.F.Li;  Z.H.Ding;  R.Deng
收藏  |  浏览/下载:1/0  |  提交时间:2020/08/24
A Coupled Adaptive PI Tuning Method for Rapid Thermal Processing Systems 会议论文
12th International Conference on Fuzzy Systems and Knowledge Discovery (FSKD), 2015-01-01
作者:  Su, Xia[1];  Zhang, Xianxia[2]
收藏  |  浏览/下载:11/0  |  提交时间:2019/04/26
Effect of rapid thermal processing on copper precipitation in p/p(+) silicon epitaxial wafers with heavily boron-doped substrates 期刊论文
http://dx.doi.org/10.1063/1.4862179, 2014
Xu, Jin; Ji, Chuan; Zhang, Guangchao; 徐进
收藏  |  浏览/下载:4/0  |  提交时间:2015/07/22
Effect of rapid thermal processing on copper precipitation in p/p silicon epitaxial wafers with heavily boron-doped substrates 期刊论文
http://dx.doi.org/10.1063/1.4862179, 2014
Xu, Jin; Ji, Chuan; Zhang, Guangchao; 徐进
收藏  |  浏览/下载:5/0  |  提交时间:2015/07/22
A new photoluminescence band in copper-contaminated n-type Czochralski silicon 期刊论文
http://dx.doi.org/10.1016/j.jcrysgro.2014.09.001, 2014
Xu, Jin,; Xie, Tingting; Lv, Yaochao; Ji, Chuan; 徐进
收藏  |  浏览/下载:2/0  |  提交时间:2015/07/22
点缺陷对硼掺杂直拉硅单晶p/p~+外延片中铜沉淀的影响 期刊论文
http://epub.cnki.net/grid2008/brief/detailj.aspx?filename=WLXB2012110500N&dbname=CAPJ2012, 2012
吉川; 徐进
收藏  |  浏览/下载:2/0  |  提交时间:2013/04/18
Infrared response of the lateral PIN structure of a highly titanium-doped silicon-on-insulator material 期刊论文
chinese physics b, 2011, 卷号: 20, 期号: 10, 页码: 106104
Ma, ZH; Cao, Q; Zuo, YH; Zheng, J; Xue, CL; Cheng, BW; Wang, QM
收藏  |  浏览/下载:26/0  |  提交时间:2012/02/06


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