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期刊论文 [104]
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Effect of geometry error on accuracy of large-diameter pads used for CMP dressing
期刊论文
International Journal of Advanced Manufacturing Technology, 2019, 卷号: 100, 页码: 1505-1520
作者:
Ban, X.X.
;
Zhao, H.Y.
;
Zhao, S.J.
;
Xie, R.Q.
;
Gu, Y.W.
收藏
  |  
浏览/下载:14/0
  |  
提交时间:2019/11/19
Chemical mechanical polishing(CMP)
Geometry errors
Measured values
Polishing pads
Polyurethane pads
Profile accuracies
Spherical surface
Surface profiles
Insights into the atomistic behavior in diamond chemical mechanical polishing with center dot OH environment using ReaxFF molecular dynamics simulation
期刊论文
COMPUTATIONAL MATERIALS SCIENCE, 2019, 卷号: 166, 页码: 136-142
作者:
Shi, Zhuoying
;
Jin, Zhuji
;
Guo, Xiaoguang
;
Yuan, Song
;
Guo, Jiang
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2019/12/02
Diamond
Chemical mechanical polishing
Removal mechanism
Molecular dynamics simulation
ReaxFF
Precision Fabrication of Thin Copper Substrate by Double-sided Lapping and Chemical Mechanical Polishing
期刊论文
JOURNAL OF MANUFACTURING PROCESSES, 2019, 卷号: 44, 页码: 47-54
作者:
Pan, Bo
;
Kang, Renke
;
Guo, Jiang
;
Fu, Haiyang
;
Du, Dongxing
收藏
  |  
浏览/下载:44/0
  |  
提交时间:2019/12/02
Double-sided lapping
Chemical mechanical polishing
Flatness
Surface integrity
Residual stress
Photochemically combined mechanical polishing of N-type gallium nitride wafer in high efficiency
期刊论文
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2019, 卷号: 55, 页码: 14-21
作者:
Ou, Li -Wei
;
Wang, Ya-Hui
;
Hu, Hui-Qing
;
Zhang, Liang-Liang
;
Dong, Zhi-Gang
收藏
  |  
浏览/下载:10/0
  |  
提交时间:2019/12/02
Gallium nitride
Chemical mechanical polishing
Photo-assisted oxidation
Potassium persulfate
Material removal rate
A novel chemical mechanical polishing slurry for yttrium aluminum garnet crystal
期刊论文
APPLIED SURFACE SCIENCE, 2019, 卷号: 496
作者:
Zhang, Zili
;
Jin, Zhuji
;
Guo, Jiang
;
Han, Xiaolong
;
Mu, Qing
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2019/12/02
Yttrium aluminum garnet
Chemical mechanical polishing
Surface roughness
Material removal rate
Reaction mechanism
Preparation of ellipsoidal rod-shaped silica nanocomposite abrasives by Chromium ion/PEG200 induced method for sapphire substrates chemical mechanical polishing
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 777, 页码: 1294-1303
作者:
Dong, Yue[1]
;
Lei, Hong[2]
;
Liu, Wenqing[3]
;
Chen, Yi[4]
收藏
  |  
浏览/下载:13/0
  |  
提交时间:2019/04/22
Ellipsoidal rod-shaped silica nanocomposite abrasives
Chemical mechanical polishing
Polishing mechanism
Sapphire substrates
Highly efficient removal of sapphire by composite nanoabrasive with novel inorganic polyelectrolyte as a binder
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 782, 页码: 709-715
作者:
Wang, Tianxian[1]
;
Lei, Hong[2]
;
Dong, Yue[3]
;
Xu, Lei[4]
;
Dai, Sanwei[5]
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2019/04/22
Novel inorganic polyelectrolyte
Composite abrasive
Chemical mechanical polishing
High material removal rate
Mechanism
Sapphire
Silica Nano-particle Anneal Treatment and Its Effect on Chemical Mechanical Polishing
期刊论文
Journal of Electrical Engineering & Technology, 2019, 卷号: Vol.14 No.1, 页码: 355-361
作者:
Shibin Lu
;
Ying Meng
;
Haibo Wang
;
Junning Chen
;
Feifei Wang
收藏
  |  
浏览/下载:140/0
  |  
提交时间:2019/04/24
Silicon
Chemical mechanical polishing
Colloid silica
Nano-indentation
Atomistic mechanisms of Cu CMP in aqueous H2O2: Molecular dynamics simulations using ReaxFF reactive force field
期刊论文
COMPUTATIONAL MATERIALS SCIENCE, 2018, 卷号: 155, 页码: 476-482
作者:
Guo, Xiaoguang
;
Wang, Xiaoli
;
Jin, Zhuji
;
Kang, Renke
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2019/12/02
Copper
Chemical mechanical polishing (CMP)
ReaxFF reactive force field
Polishing pressure
Design of an ultraprecision computerized numerical control chemical mechanical polishing machine and its implementation
期刊论文
OPTICAL ENGINEERING, 2018, 卷号: 57
作者:
Zhang, Chupeng
;
Zhao, Huiying
;
Zhu, Xueliang
;
Zhao, Shijie
;
Jiang, Chunye
收藏
  |  
浏览/下载:9/0
  |  
提交时间:2019/11/26
chemical mechanical polishing
design principle
diamond tool dressing
gas hydrostatic linear guideway
gas hydrostatic rotary table
kinematic errors
tin plate
ultraprecision machine tool
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