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CORC

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The chemistry and thermal stability of HfTaO/Si interface by x-ray photoelectron spectroscopy 期刊论文
SURFACE AND INTERFACE ANALYSIS, 2012, 卷号: 44, 期号: 4, 页码: 395-398
Yu, T; Jin, CG; Yang, XM; Wu, XM; Zhuge, LJ; Ge, SB
收藏  |  浏览/下载：18/0  |  提交时间：2013/04/17
The structure and electrical properties of HfTaON high-k films prepared by DIBSD 期刊论文
APPLIED SURFACE SCIENCE, 2012, 卷号: 258, 期号: 7, 页码: 2953-2958
Yu, T; Jin, CG; Yang, XM; Dong, YJ; Zhang, HY; Zhuge, LJ; Wu, XM; Wu, ZF
收藏  |  浏览/下载：9/0  |  提交时间：2013/04/17
The chemistry and thermal stability of HfTaO/Si interface by x-ray photoelectron spectroscopy 期刊论文
SURFACE AND INTERFACE ANALYSIS, 2012, 卷号: 44, 期号: 4, 页码: 395-398
Yu, T; Jin, CG; Yang, XM; Wu, XM; Zhuge, LJ; Ge, SB
收藏  |  浏览/下载：8/0  |  提交时间：2013/05/10
The structure and electrical properties of HfTaON high-k films prepared by DIBSD 期刊论文
APPLIED SURFACE SCIENCE, 2012, 卷号: 258, 期号: 7, 页码: 2953-2958
Yu, T; Jin, CG; Yang, XM; Dong, YJ; Zhang, HY; Zhuge, LJ; Wu, XM; Wu, ZF
收藏  |  浏览/下载：9/0  |  提交时间：2013/05/10
Study on changes in the structure of HfSiO and HfSiON dielectrics with different annealing temperature by photoelectron spectroscopy 期刊论文
APPLIED SURFACE SCIENCE, 2011, 卷号: 257, 期号: 22, 页码: 9277-9281
Yang, XM; Yu, T; Wu, XM; Zhuge, LJ; Ge, SB; He, JJ
收藏  |  浏览/下载：8/0  |  提交时间：2012/04/10
Improvement of thermal stability and electrical performance in HfSiO gate dielectrics by nitrogen incorporation 期刊论文
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2011, 卷号: 44, 期号: 2, 页码: 361-366
Yang, XM; Wu, XM; Zhuge, LJ; Yu, T
收藏  |  浏览/下载：10/0  |  提交时间：2012/04/10
The influence of assisted ion beam bombardment on structure and electrical characteristics of HfSiO dielectric synthesized by DIBSD 期刊论文
MICROELECTRONICS RELIABILITY, 2011, 卷号: 51, 期号: 12, 页码: 2115-2118
Yang, XM; Zhuge, LJ; Wu, XM; Yu, T; Ge, SB
收藏  |  浏览/下载：12/0  |  提交时间：2012/04/10
The influence of assisted ion beam bombardment on structure and electrical characteristics of HfSiO dielectric synthesized by DIBSD 期刊论文
MICROELECTRONICS RELIABILITY, 2011, 卷号: 51, 期号: 12, 页码: 2115-2118
Yang, XM; Zhuge, LJ; Wu, XM; Yu, T; Ge, SB
收藏  |  浏览/下载：15/0  |  提交时间：2013/05/10
Study on changes in the structure of HfSiO and HfSiON dielectrics with different annealing temperature by photoelectron spectroscopy 期刊论文
APPLIED SURFACE SCIENCE, 2011, 卷号: 257, 期号: 22, 页码: 9277-9281
Yang, XM; Yu, T; Wu, XM; Zhuge, LJ; Ge, SB; He, JJ
收藏  |  浏览/下载：15/0  |  提交时间：2013/05/10
Improvement of thermal stability and electrical performance in HfSiO gate dielectrics by nitrogen incorporation 期刊论文
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2011, 卷号: 44, 期号: 2, 页码: 361-366
Yang, XM; Wu, XM; Zhuge, LJ; Yu, T
收藏  |  浏览/下载：16/0  |  提交时间：2013/05/10

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