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Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations 期刊论文
applied optics, 2009, 卷号: 48, 期号: 19
Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan
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