Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

	Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations
	Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan
刊名	applied optics
	2009
卷号	48 期号:19
合作状况	其它
学科主题	光学
收录类别	其他
语种	中文
公开日期	2010-04-26 ; 2010-10-12
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/6588]
专题	上海光学精密机械研究所_信息光学开放实验室
推荐引用方式 GB/T 7714	Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations[J]. applied optics,2009,48(19).
APA	Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan.(2009).Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations.applied optics,48(19).
MLA	Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan."Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations".applied optics 48.19(2009).