×
验证码:
换一张
忘记密码?
记住我
CORC
首页
科研机构
检索
知识图谱
申请加入
托管服务
登录
注册
在结果中检索
科研机构
长春光学精密机械与物... [2]
内容类型
会议论文 [1]
学位论文 [1]
发表日期
2015 [1]
2011 [1]
×
知识图谱
CORC
开始提交
已提交作品
待认领作品
已认领作品
未提交全文
收藏管理
QQ客服
官方微博
反馈留言
浏览/检索结果:
共2条,第1-2条
帮助
限定条件
专题:长春光学精密机械与物理研究所
第一署名单位
第一作者单位
通讯作者单位
已选(
0
)
清除
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
作者升序
作者降序
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
大光栅刻划机刻划系统结构设计与刻线弯曲误差机械修正
学位论文
博士: 中国科学院大学, 2015
作者:
宋楠
收藏
  |  
浏览/下载:26/0
  |  
提交时间:2015/11/30
大光栅刻划机
刻划系统
光栅刻线弯曲误差
机械修正方法
气浮导轨
Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE)
会议论文
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.
收藏
  |  
浏览/下载:20/0
  |  
提交时间:2013/03/25
In ultraviolet spectroscopy
groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore
there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order
it is important to control the groove shape precisely
so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm
especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method
the required blaze angle is small
we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles
and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model
the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides
since the etched groove shape depends on the aspect ratio of the photoresist mask ridge
if we wish to fabricate larger gratings with this method
we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
©版权所有 ©2017 CSpace - Powered by
CSpace