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| Photocatalytic material and dual-photocatalytic electrode self-bias pollution control system comprises reactor, aeration device and power generation device, where reactor is square quartz single-chamber reactor. 专利 申请日期: 2018-01-01, 公开日期: 2018-04-24 作者: LIU L LA B ZHANG Y
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:12/0  |  提交时间:2019/12/02 |
| HEAT EXCHANGE MEDIUM, HEAT EXCHANGE SYSTEM, AND NUCLEAR REACTOR SYSTEM 专利 专利号: EP2862912A1, 申请日期: 2015-04-22, 公开日期: 2015-04-22 作者: ZHAN, WENLONG ; YANG, LEI ; XU, HUSHAN![](/image/person.jpg)
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:11/0  |  提交时间:2018/12/27 |
| MCR (magnetic-valve controllable reactor)-based treating device of unbalanced power distribution system of electro-slag furnaces 专利 申请日期: 2014-01-01, 作者: WANG QUNJING; WU SHENGKUI; ZHU MINGXING; CHEN LIE; GAO HONGYAN
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:4/0  |  提交时间:2019/04/19 |
| Reforming synthetic methane gas comprises activating spark discharge gas using tube-type reactor with high voltage electrode and high voltage alternating current power supply, converting methane gas to the product and then discharging. 专利 申请日期: 2014-01-01, 公开日期: 2014-10-01 作者: WANG D ZHANG J GUO H
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:2/0  |  提交时间:2019/12/11 |
| Nuclear power reactor coolant core main pump motor stator shielding high-voltage non-gap plastic deformation adhered sealing structure, has upper sealing ring whose upper part is formed with radial expansion gap. 专利 申请日期: 2013-01-01, 公开日期: 2013-05-08 作者: JIANG W LIU H XU X
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:2/0  |  提交时间:2019/12/13 |
| Horizontal reactor for compound semiconductor growth 专利 专利号: US6214116, 申请日期: 2001-04-10, 公开日期: 2001-04-10 作者: SHIN, HYUN KEEL
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:9/0  |  提交时间:2019/12/26 |
| Method of characterizing optical parameters of opto-electronic components and apparatus for carrying out the method, particularly during a coating operation 专利 专利号: US5252497, 申请日期: 1993-10-12, 公开日期: 1993-10-12 作者: IDLER, WILFRIED
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:8/0  |  提交时间:2019/12/26 |
| Manufacture of semiconductor device 专利 专利号: JP1986216319A, 申请日期: 1986-09-26, 公开日期: 1986-09-26 作者: OSAKA SHIGEO
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:2/0  |  提交时间:2020/01/18 |