| Growth and characterization of DC magnetron sputtered GZO:Ti films | |
| Guo, Meixia; Li, Jie | |
| 刊名 | Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology
 |
| 2012 | |
| 卷号 | 32期号:4页码:324-327 |
| DOI | 10.3969/j.issn.1672-7126.2012.04.11 |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5214990 |
| 专题 | 山东大学 |
| 作者单位 | School of Science, Shandong University of Technology, Zibo 255049, China |
| 推荐引用方式 GB/T 7714 | Guo, Meixia,Li, Jie. Growth and characterization of DC magnetron sputtered GZO:Ti films[J]. Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology,2012,32(4):324-327. |
| APA | Guo, Meixia,&Li, Jie.(2012).Growth and characterization of DC magnetron sputtered GZO:Ti films.Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology,32(4),324-327. |
| MLA | Guo, Meixia,et al."Growth and characterization of DC magnetron sputtered GZO:Ti films".Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology 32.4(2012):324-327. |
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