Growth and characterization of DC magnetron sputtered GZO:Ti films | |
Guo, Meixia; Li, Jie | |
刊名 | Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology |
2012 | |
卷号 | 32期号:4页码:324-327 |
DOI | 10.3969/j.issn.1672-7126.2012.04.11 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5214990 |
专题 | 山东大学 |
作者单位 | School of Science, Shandong University of Technology, Zibo 255049, China |
推荐引用方式 GB/T 7714 | Guo, Meixia,Li, Jie. Growth and characterization of DC magnetron sputtered GZO:Ti films[J]. Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology,2012,32(4):324-327. |
APA | Guo, Meixia,&Li, Jie.(2012).Growth and characterization of DC magnetron sputtered GZO:Ti films.Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology,32(4),324-327. |
MLA | Guo, Meixia,et al."Growth and characterization of DC magnetron sputtered GZO:Ti films".Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology 32.4(2012):324-327. |
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