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Influence of substrate bias voltage on the microstructure of nc-SiOx:H film
Li Hui-Min[1]; Yu Wei[2]; Xu Yan-Mei[3]; Ji Yun[4]; Jiang Zhao-Yi[5]; Wang Xin-Zhan[6]; Li Xiao-Wei[7]; Fu Guang-Sheng[8]
刊名CHINESE PHYSICS B
2015
卷号24期号:2
关键词nc-SiOx:H microstructure substrate bias voltage
ISSN号1674-1056
DOIhttp://dx.doi.org/10.1088/1674-1056/24/2/028102
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5072670
专题河北大学
作者单位1.[1]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
2.[2]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
3.[3]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
4.[4]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
5.[5]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
6.[6]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
7.[7]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
8.[8]Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Opt Elect Informat Mat, Baoding 071002, Peoples R China.
推荐引用方式
GB/T 7714
Li Hui-Min[1],Yu Wei[2],Xu Yan-Mei[3],et al. Influence of substrate bias voltage on the microstructure of nc-SiOx:H film[J]. CHINESE PHYSICS B,2015,24(2).
APA Li Hui-Min[1].,Yu Wei[2].,Xu Yan-Mei[3].,Ji Yun[4].,Jiang Zhao-Yi[5].,...&Fu Guang-Sheng[8].(2015).Influence of substrate bias voltage on the microstructure of nc-SiOx:H film.CHINESE PHYSICS B,24(2).
MLA Li Hui-Min[1],et al."Influence of substrate bias voltage on the microstructure of nc-SiOx:H film".CHINESE PHYSICS B 24.2(2015).
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