| Pressure-induced emission enhancement in hexaphenylsilole: a computational study | |
| Zhang, Tian; Shi, Wen; Wang, Dong; Zhuo, Shuping; Peng, Qian; Shuai, Zhigang | |
| 刊名 | JOURNAL OF MATERIALS CHEMISTRY C
 |
| 2019 | |
| 卷号 | 7期号:5页码:1388-1398 |
| DOI | 10.1039/c8tc05162c |
| URL标识 | 查看原文 |
| 公开日期 | [db:dc_date_available] |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/4541871 |
| 专题 | 山东大学 |
| 作者单位 | 1.Shandong Univ Technol, Sch Chem & Chem Engn, Zibo 255049, Peoples R China. 2.[Zhang, Tian 3.Shi, Wen 4.Wang, Dong 5.Shuai, |
| 推荐引用方式 GB/T 7714 | Zhang, Tian,Shi, Wen,Wang, Dong,et al. Pressure-induced emission enhancement in hexaphenylsilole: a computational study[J]. JOURNAL OF MATERIALS CHEMISTRY C,2019,7(5):1388-1398. |
| APA | Zhang, Tian,Shi, Wen,Wang, Dong,Zhuo, Shuping,Peng, Qian,&Shuai, Zhigang.(2019).Pressure-induced emission enhancement in hexaphenylsilole: a computational study.JOURNAL OF MATERIALS CHEMISTRY C,7(5),1388-1398. |
| MLA | Zhang, Tian,et al."Pressure-induced emission enhancement in hexaphenylsilole: a computational study".JOURNAL OF MATERIALS CHEMISTRY C 7.5(2019):1388-1398. |
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