Pressure-induced emission enhancement in hexaphenylsilole: a computational study | |
Zhang, Tian; Shi, Wen; Wang, Dong; Zhuo, Shuping; Peng, Qian; Shuai, Zhigang | |
刊名 | JOURNAL OF MATERIALS CHEMISTRY C |
2019 | |
卷号 | 7期号:5页码:1388-1398 |
DOI | 10.1039/c8tc05162c |
URL标识 | 查看原文 |
公开日期 | [db:dc_date_available] |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4541871 |
专题 | 山东大学 |
作者单位 | 1.Shandong Univ Technol, Sch Chem & Chem Engn, Zibo 255049, Peoples R China. 2.[Zhang, Tian 3.Shi, Wen 4.Wang, Dong 5.Shuai, |
推荐引用方式 GB/T 7714 | Zhang, Tian,Shi, Wen,Wang, Dong,et al. Pressure-induced emission enhancement in hexaphenylsilole: a computational study[J]. JOURNAL OF MATERIALS CHEMISTRY C,2019,7(5):1388-1398. |
APA | Zhang, Tian,Shi, Wen,Wang, Dong,Zhuo, Shuping,Peng, Qian,&Shuai, Zhigang.(2019).Pressure-induced emission enhancement in hexaphenylsilole: a computational study.JOURNAL OF MATERIALS CHEMISTRY C,7(5),1388-1398. |
MLA | Zhang, Tian,et al."Pressure-induced emission enhancement in hexaphenylsilole: a computational study".JOURNAL OF MATERIALS CHEMISTRY C 7.5(2019):1388-1398. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论