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	Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting
	Shi, Shuang; Dong, Wei; Peng, Xu; Jiang, Dachuan; Tan, Yi
刊名	APPLIED SURFACE SCIENCE
	2013
卷号	266页码:344-349
关键词	Electron beam melting Evaporation Removal mechanism Phosphorus Silicon
ISSN号	0169-4332
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4538372
专题	大连理工大学
作者单位	Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China.,Key Lab Solar Energy Photovolta Liaoning Prov, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Shi, Shuang,Dong, Wei,Peng, Xu,et al. Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting[J]. APPLIED SURFACE SCIENCE,2013,266:344-349.
APA	Shi, Shuang,Dong, Wei,Peng, Xu,Jiang, Dachuan,&Tan, Yi.(2013).Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting.APPLIED SURFACE SCIENCE,266,344-349.
MLA	Shi, Shuang,et al."Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting".APPLIED SURFACE SCIENCE 266(2013):344-349.

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