Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting | |
Shi, Shuang; Dong, Wei; Peng, Xu; Jiang, Dachuan; Tan, Yi | |
刊名 | APPLIED SURFACE SCIENCE |
2013 | |
卷号 | 266页码:344-349 |
关键词 | Electron beam melting Evaporation Removal mechanism Phosphorus Silicon |
ISSN号 | 0169-4332 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4538372 |
专题 | 大连理工大学 |
作者单位 | Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China.,Key Lab Solar Energy Photovolta Liaoning Prov, Dalian 116024, Peoples R China. |
推荐引用方式 GB/T 7714 | Shi, Shuang,Dong, Wei,Peng, Xu,et al. Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting[J]. APPLIED SURFACE SCIENCE,2013,266:344-349. |
APA | Shi, Shuang,Dong, Wei,Peng, Xu,Jiang, Dachuan,&Tan, Yi.(2013).Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting.APPLIED SURFACE SCIENCE,266,344-349. |
MLA | Shi, Shuang,et al."Evaporation and removal mechanism of phosphorus from the surface of silicon melt during electron beam melting".APPLIED SURFACE SCIENCE 266(2013):344-349. |
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