Secondary electron emission characteristics of TiN coatings produced by RF magnetron sputtering | |
Wang, Dan; He, Yongning; Cui, Wanzhao | |
刊名 | JOURNAL OF APPLIED PHYSICS |
2018 | |
卷号 | 124 |
ISSN号 | 0021-8979 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2920799 |
专题 | 西安交通大学 |
推荐引用方式 GB/T 7714 | Wang, Dan,He, Yongning,Cui, Wanzhao. Secondary electron emission characteristics of TiN coatings produced by RF magnetron sputtering[J]. JOURNAL OF APPLIED PHYSICS,2018,124. |
APA | Wang, Dan,He, Yongning,&Cui, Wanzhao.(2018).Secondary electron emission characteristics of TiN coatings produced by RF magnetron sputtering.JOURNAL OF APPLIED PHYSICS,124. |
MLA | Wang, Dan,et al."Secondary electron emission characteristics of TiN coatings produced by RF magnetron sputtering".JOURNAL OF APPLIED PHYSICS 124(2018). |
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