Effect of Benzoyl Peroxide/N, N-Dimethyl aniline initiating system on material removal rate in abrasive-free polishing of hard disk substrate | |
Jiang, Ting[1]; Lei, Hong[2] | |
2014 | |
会议名称 | International Conference on Planarization CMP Technology (ICPT) |
页码 | 325-329 |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2275846 |
专题 | 上海大学 |
作者单位 | 1.[1]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. 2.[2]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. |
推荐引用方式 GB/T 7714 | Jiang, Ting[1],Lei, Hong[2]. Effect of Benzoyl Peroxide/N, N-Dimethyl aniline initiating system on material removal rate in abrasive-free polishing of hard disk substrate[C]. 见:International Conference on Planarization CMP Technology (ICPT). |
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