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AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate
Lei, Hong[1]; Ren, Xiaoyan[2]
刊名JOURNAL OF ELECTRONIC MATERIALS
2015
卷号44页码:1245-1252
关键词Abrasive-free polishing hard disk substrate material removal rate initiator AIBA
ISSN号0361-5235
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2237087
专题上海大学
作者单位1.[1]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.
2.[2]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.
推荐引用方式
GB/T 7714
Lei, Hong[1],Ren, Xiaoyan[2]. AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate[J]. JOURNAL OF ELECTRONIC MATERIALS,2015,44:1245-1252.
APA Lei, Hong[1],&Ren, Xiaoyan[2].(2015).AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate.JOURNAL OF ELECTRONIC MATERIALS,44,1245-1252.
MLA Lei, Hong[1],et al."AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate".JOURNAL OF ELECTRONIC MATERIALS 44(2015):1245-1252.
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