AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate | |
Lei, Hong[1]; Ren, Xiaoyan[2] | |
刊名 | JOURNAL OF ELECTRONIC MATERIALS |
2015 | |
卷号 | 44页码:1245-1252 |
关键词 | Abrasive-free polishing hard disk substrate material removal rate initiator AIBA |
ISSN号 | 0361-5235 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2237087 |
专题 | 上海大学 |
作者单位 | 1.[1]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. 2.[2]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. |
推荐引用方式 GB/T 7714 | Lei, Hong[1],Ren, Xiaoyan[2]. AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate[J]. JOURNAL OF ELECTRONIC MATERIALS,2015,44:1245-1252. |
APA | Lei, Hong[1],&Ren, Xiaoyan[2].(2015).AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate.JOURNAL OF ELECTRONIC MATERIALS,44,1245-1252. |
MLA | Lei, Hong[1],et al."AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate".JOURNAL OF ELECTRONIC MATERIALS 44(2015):1245-1252. |
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