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Retention loss in the ferroelectric (SrBi2Ta2O9)-insulator (HfO2)-silicon structure studied by piezoresponse force microscopy 期刊论文
EPL, 2012, 卷号: 98
作者:  Zhang, Z. H.;  Zhong, X. L.;  Zhang, Y.;  Wang, J. B.;  Lu, C. J.
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