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Superlens imaging lithography for high aspect ratio sub-wavelength pattern employing trilayer resist process 期刊论文
Microelectronic Engineering, 2013, 卷号: 110, 页码: 35-39
作者:  Fang, Liang;  Pan, Li;  Wang, Changtao;  Luo, Xiangang
收藏  |  浏览/下载:9/0  |  提交时间:2016/11/22


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