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LD纵向泵浦Tm3+:GdVO4激光器研究 学位论文
2011, 2010
林佳丽
收藏  |  浏览/下载:4/0  |  提交时间:2016/02/14
Tm3+:GdVO4固体激光器的理论与实验研究 学位论文
2011, 2011
廖雄勇
收藏  |  浏览/下载:3/0  |  提交时间:2016/02/14
Impact of pump saturation and SRS between channels on B-DFRA gain spectrum 期刊论文
2010, 2010
Huo Yi-jie; Zhang Wei; Peng Jiang-de; Liu Xiao-ming
收藏  |  浏览/下载:3/0
Evaluation of optical properties of self-frequency-doubling crystal Yb:GdYAl/sub 3/(BO/sub 3/)/sub 4/ for laser applications 期刊论文
2010, 2010
Li Jing; Li Qiang; Wang Ji-Yang; Zhao Hong-Yang
收藏  |  浏览/下载:3/0
The spectral feature analysis of semiconductor thin disk laser (EI CONFERENCE) 会议论文
Optoelectronic Materials and Devices II, November 2, 2007 - November 5, 2007, Wuhan, China
He C.-F.; Qin L.; Li J.; Cheng L.-W.; Liang X.-M.; Ning Y.-Q.; Wang L.-J.
收藏  |  浏览/下载:22/0  |  提交时间:2013/03/25
The semiconductor thin disk laser is a new type of semiconductor laser. This work gives the basic operation function of semiconductor disk laser  and analyses the heat effect by the experimentally measured photoluminescence spectrum of the laser chip at different pump power and different temperature. We can see that: with increasing pump power  the thermal effects of the gain material becomes seriously and causes the saturation of carrier lifetime  so the electron-hole pair created in the absorbtion layer have no enough time to rate to one of the wells  and the non-radiative recombination happens in the barrier. When the thermal effects becomes stronger  the chip will not lasing. This phenomenon is from the smaller energy offset between barrier and quantum well. We optimize the original structure design and experimental technology. A non-absorbing AlGaAs layer who is transparent to the pumping and laser wavelength is added to confine the carriers in the quantum wells. At the same time a DBR with double reflecting band is induced to improve the absorbing efficiency of the pumping light. The single QW is replaced by the three narrow QWs  This three QWs structure can add the quantum state of QW  increase the recombination probability of carriers in the QWs and reduce the heat effect. The chemical etch equipment is also improved to control the surface unevenness to be within 50 nm.  
The generation of high efficiency and high quality and high stability parametric amplified light 期刊论文
acta physica sinica, 2004, 卷号: 53, 期号: 1, 页码: 105-113
作者:  Liu, HJ;  Chen, GF;  Zhao, W;  Wang, YS
收藏  |  浏览/下载:11/0  |  提交时间:2015/11/12


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