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浏览/检索结果: 共2条，第1-2条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 李斯特《三首音乐会练习曲》研究 学位论文 2013, 2013 蔡王冰 收藏  |  浏览/下载：5/0  |  提交时间：2016/01/13 李斯特练习曲  音乐特征  技巧难点  Liszt’s etudes  music characteristics  difficult points of technique   Key techniques of laser direct writing patterns on spherical substrate (EI CONFERENCE) 会议论文 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China Feng X.-G.; Zhao J.-L. 收藏  |  浏览/下载：17/0  |  提交时间：2013/03/25 Comparing with the writing method of plane pattern  spherical pattern' has some remarkable different on several points. Firstly  it is difficult to spin-coated a uniform photoresist film on a spherical substrate  especially the ratio of spherical radius to caliber is smaller  and the spin-coated way must match the ratio of spherical radius to caliber. Secondly  if the sphere couldn't be regarded as a plane  a so-called concentric optical scan movement way must be applied for the generation of spherical pattern  because the reflex of substrate will affect the quantity of illumination. Commonly  an alignment technique is indispensable with pattern generation of spherical surface by the concentric optical scan in order to ensure the orthogonal intersection of focusing laser beam and writing surface. Thirdly  a uniform velocity control must be considered for the laser direct writing method on a spherical substrate. Otherwise  the exposure time of photoresist will be different  and the line widths of pattern will be also different at different areas. Fourthly  commonly  because the errors of concentric machine and substrate surface shape are bigger  so focusing servo-control technique is also needful for writing a pattern on a spherical substrate. Focusing servo-control may keep the focal spot on the spherical surface by a focus detection and control system in the course of writing pattern. Using these techniques  we fabricated a line width of 7m and a period of 600m isometric mesh on the concave of a spherical substrate.