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Metal–insulator transition in few-layered GaTe transistors
期刊论文
半导体学报:英文版, 2020, 卷号: 41.0, 期号: 007, 页码: 28-32
作者:
Xiuxin Xia
;
Xiaoxi Li
;
Hanwen Wang
收藏
  |  
浏览/下载:61/0
  |  
提交时间:2021/02/02
metal-insulator
transition
gate
tunable
GaTe
field
effect
transistors
Metal–insulator transition in few-layered GaTe transistors
期刊论文
半导体学报:英文版, 2020, 卷号: 41.0, 期号: 007, 页码: 28-32
作者:
Xiuxin Xia
;
Xiaoxi Li
;
Hanwen Wang
收藏
  |  
浏览/下载:40/0
  |  
提交时间:2021/02/02
metal-insulator
transition
gate
tunable
GaTe
field
effect
transistors
Aqueous solution-processed, self-flattening AlOx:Y dielectrics for fully-transparent thin-film transistors
期刊论文
CERAMICS INTERNATIONAL, 2019, 卷号: 45, 期号: 13, 页码: 15883-15891
作者:
Wu, Weihua
;
Liang, Lingyan
;
Yu, Jingjing
;
Xiao, Xi
;
Zhang, Hongliang
收藏
  |  
浏览/下载:58/0
  |  
提交时间:2019/12/18
METAL-OXIDE-SEMICONDUCTOR
LOW-TEMPERATURE
HIGH-PERFORMANCE
SOL-GEL
GATE DIELECTRICS
HIGH-MOBILITY
LOW-VOLTAGE
ELECTRICAL PERFORMANCE
COMBUSTION SYNTHESIS
WATER
EMI mitigation in switching power converters combining closed-loop gate drive and chaotic frequency modulation technique
期刊论文
IET POWER ELECTRONICS, 2019, 卷号: 12, 页码: 3033-3040
作者:
Cui, Tongkai
;
Ma, Qishuang
;
Xu, Ping
;
Zhang, Poming
收藏
  |  
浏览/下载:12/0
  |  
提交时间:2019/12/30
electromagnetic interference
switching convertors
insulated gate bipolar transistors
power MOSFET
switching transients
switching power converters
chaotic frequency modulation technique
chaotic switching frequency modulation technique
Gaussian S-shape switching transients
EMI mitigation
closed-loop gate drive
voltage transients
current transients
power metal oxide semiconductor field effect transistor
insulated-gate bipolar transistor
conducted emissions
radiated emission
Interface Modulation and Optimization of Electrical Properties of HfGdO/GaAs Gate Stacks by ALD-Derived Al2O3 Passivation Layer and Forming Gas Annealing
期刊论文
ADVANCED ELECTRONIC MATERIALS, 2018, 卷号: 4, 期号: 4, 页码: 9
作者:
Jiang, Shanshan
;
He, Gang
;
Liu, Mao
;
Zhu, Li
;
Liang, Shuang
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  |  
浏览/下载:67/0
  |  
提交时间:2019/06/10
electrical properties
forming gas annealing
high-k gate dielectrics
interface chemistry
metal-oxide-semiconductor capacitors
Efficient skyrmion transport mediated by a voltage controlled magnetic anisotropy gradient
期刊论文
NANOSCALE, 2018, 卷号: 10, 期号: 2, 页码: 733-740
作者:
Wang, Xuan
;
Gan, W. L.
;
Martinez, J. C.
;
Tan, F. N.
;
Jalil, M. B. A.
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  |  
浏览/下载:5/0
  |  
提交时间:2019/11/15
Propulsion
Refractory metal compounds
Gate electrodes
Over current
Packing density
Potential wells
Skyrmion dynamics
Skyrmions
Spin torque
Voltage-controlled
Liquid Metal Magnetohydrodynamic Pump for Junction Temperature Control of Power Modules
期刊论文
IEEE TRANSACTIONS ON POWER ELECTRONICS, 2018, 卷号: 33, 页码: 10583-10593
作者:
Yerasimou, Yerasimos
;
Pickert, Volker
;
Ji, Bing
;
Song, Xueguan
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2019/12/02
Insulated-gate bipolar transistor (IGBT) power module cooling
junction temperature
liquid metal cooling
magnetohydrodynamic (MHD) pump
reliability
Carbon-Dots-Based Lab-On-a-Nanoparticle Approach for the Detection and Differentiation of Antibiotics
期刊论文
CHEMISTRY-A EUROPEAN JOURNAL, 2018, 卷号: 24, 期号: 18, 页码: 4703-4709
作者:
Qiao, Li'na
;
Qian, Sihua
;
Wang, Yuhui
;
Yan, Shifeng
;
Lin, Hengwei
收藏
  |  
浏览/下载:34/0
  |  
提交时间:2018/12/04
Performance Liquid-chromatography
Colorimetric Sensor Array
Tandem Mass-spectrometry
Multiion Analysis
Sensing Device
Quantum Dots
Logic Gate
Metal-ions
Discrimination
Water
Analysis of the electrical properties and current transportation mechanism of a metal oxide semiconductor (MOS) capacitor based on HfGdO gate dielectrics
期刊论文
Journal of Alloys and Compounds, 2018, 卷号: Vol.757, 页码: 288-297
作者:
J.G. Lv
;
Y.M. Liu
;
P.H. Wang
;
S.S. Jiang
;
G. He
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2019/04/22
High-k
gate
dielectrics
HfGdO
Electrical
properties
Metal
oxide
semiconductor
transistors
Leakage
current
density
Interface Modulation and Optimization of Electrical Properties of HfGdO/GaAs Gate Stacks by ALD‐Derived Al2O3 Passivation Layer and Forming Gas Annealing
期刊论文
Advanced Electronic Materials, 2018, 卷号: Vol.4 No.4
作者:
Wendong Li
;
Shuang Liang
;
Li Zhu
;
Mao Liu
;
Mingliang Tian
收藏
  |  
浏览/下载:44/0
  |  
提交时间:2019/04/22
electrical
properties
forming
gas
annealing
high‐k
gate
dielectrics
interface
chemistry
metal‐oxide‐semiconductor
capacitors
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