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浏览/检索结果: 共5条，第1-5条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 微纳三维结构电纺直写电场聚焦控制技术研究 学位论文 2016, 2016 余兆杰 收藏  |  浏览/下载：6/0  |  提交时间：2017/06/20 电纺直写  电场聚焦  精确沉积  图案化喷印  三维成型  Electrohydrodynamic Direct Writing  Electrical Field Focusing  Precise Deposition  Pattern Printing  Three Dimensional Micro/nano Structure   电纺直写针尖诱导定位沉积行为的实验研究 学位论文 2014, 2014 林奕宏 收藏  |  浏览/下载：3/0  |  提交时间：2016/01/12 静电纺丝  针尖诱导  直写图案  微纳结构  定位精度  Electrospinning  Tip inducing  Nano structure  Direct-Writing Pattern  Depostion Precision   电纺直写运动平台开发及其图案化沉积研究 学位论文 2014, 2014 卫瑾 收藏  |  浏览/下载：3/0  |  提交时间：2016/01/12 电纺直写  运动平台  微纳结构  图案化沉积  Direct-Writing Based on Electrospinning  Motion Platform  Micro-nano Structure  Pattern Deposition   聚合物微纳米结构电纺直写行为及其控制技术研究 学位论文 2011, 2011 郑高峰 收藏  |  浏览/下载：1/0  |  提交时间：2016/02/14 电纺直写  纳米纤维  微米薄膜  定位沉积  直写图案  Direct-Writing Based on Electrospinning  Nanofiber  Micro Thin Film  Addressable Deposition  Direct-Writing Pattern   Key techniques of laser direct writing patterns on spherical substrate (EI CONFERENCE) 会议论文 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China Feng X.-G.; Zhao J.-L. 收藏  |  浏览/下载：18/0  |  提交时间：2013/03/25 Comparing with the writing method of plane pattern  spherical pattern' has some remarkable different on several points. Firstly  it is difficult to spin-coated a uniform photoresist film on a spherical substrate  especially the ratio of spherical radius to caliber is smaller  and the spin-coated way must match the ratio of spherical radius to caliber. Secondly  if the sphere couldn't be regarded as a plane  a so-called concentric optical scan movement way must be applied for the generation of spherical pattern  because the reflex of substrate will affect the quantity of illumination. Commonly  an alignment technique is indispensable with pattern generation of spherical surface by the concentric optical scan in order to ensure the orthogonal intersection of focusing laser beam and writing surface. Thirdly  a uniform velocity control must be considered for the laser direct writing method on a spherical substrate. Otherwise  the exposure time of photoresist will be different  and the line widths of pattern will be also different at different areas. Fourthly  commonly  because the errors of concentric machine and substrate surface shape are bigger  so focusing servo-control technique is also needful for writing a pattern on a spherical substrate. Focusing servo-control may keep the focal spot on the spherical surface by a focus detection and control system in the course of writing pattern. Using these techniques  we fabricated a line width of 7m and a period of 600m isometric mesh on the concave of a spherical substrate.