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Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates 期刊论文
JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267
作者:  Zhang JW(张景文)
收藏  |  浏览/下载:11/0  |  提交时间:2020/11/30
Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates 期刊论文
JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267
作者:  Zhang, Jingwen;  Fan, Bin;  Li, Zhiwei;  Gao, Guohan;  Li, Bincheng
收藏  |  浏览/下载:28/0  |  提交时间:2021/05/11
Experimental investigation of the electron impact excitation behavior in pulse-modulated radio frequency Ar/O-2 inductively coupled plasma 期刊论文
JOURNAL OF APPLIED PHYSICS, 2019, 卷号: 125
作者:  Xue, Chan;  Gao, Fei;  Wen, De-Qi;  Wang, You-Nian
收藏  |  浏览/下载:4/0  |  提交时间:2019/12/02


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