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北京航空航天大学 [2]
金属研究所 [2]
北京大学 [1]
西安交通大学 [1]
南京地理与湖泊研究所 [1]
四川大学 [1]
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期刊论文 [9]
会议论文 [2]
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2020 [2]
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2017 [1]
2016 [1]
2012 [1]
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Large influence of vacancies on the elastic constants of cubic epitaxial tantalum nitride layers grown by reactive magnetron sputtering
期刊论文
ACTA MATERIALIA, 2020, 卷号: 184, 页码: 254-266
作者:
Abadias, Gregory
;
Li, Chen-Hui
;
Belliard, Laurent
;
Hu, Qing Miao
;
Greneche, Nicolas
收藏
  |  
浏览/下载:74/0
  |  
提交时间:2021/02/02
Nitrides
Thin films
Elastic constants
Point defects
Ab initio calculations
Large influence of vacancies on the elastic constants of cubic epitaxial tantalum nitride layers grown by reactive magnetron sputtering
期刊论文
ACTA MATERIALIA, 2020, 卷号: 184, 页码: 254-266
作者:
Abadias, Gregory
;
Li, Chen-Hui
;
Belliard, Laurent
;
Hu, Qing Miao
;
Greneche, Nicolas
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2021/02/02
Nitrides
Thin films
Elastic constants
Point defects
Ab initio calculations
Characterization of tantalum and tantalum nitride films on Ti6Al4V substrate prepared by filtered cathodic vacuum arc deposition for biomedical applications
期刊论文
SURFACE & COATINGS TECHNOLOGY, 2019, 卷号: 365, 页码: 24-32
作者:
Hee, Ay Ching
;
Zhao, Yue
;
Jamali, Sina S.
;
Bendavid, Avi
;
Martin, Philip J.
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  |  
浏览/下载:11/0
  |  
提交时间:2019/12/30
Tantalum films
Tantalum nitrides
X-ray photoelectron spectroscopy
Electrochemical impedance spectroscopy
Characterization of tantalum and tantalum nitride films on Ti6Al4V substrate prepared by filtered cathodic vacuum arc deposition for biomedical applications
会议论文
SURFACE & COATINGS TECHNOLOGY, 2019-05-15
作者:
Hee, Ay Ching
;
Zhao, Yue
;
Jamali, Sina S.
;
Bendavid, Avi
;
Martin, Philip J.
收藏
  |  
浏览/下载:16/0
  |  
提交时间:2019/12/30
Tantalum films
Tantalum nitrides
X-ray photoelectron spectroscopy
Electrochemical impedance spectroscopy
Neutron powder diffraction and high-pressure synchrotron x-ray diffraction study of tantalum nitrides
期刊论文
Chinese Physics B, 2018, 卷号: Vol.27 No.2, 页码: 026201
作者:
Lei-hao Feng
;
Qi-wei Hu
;
Li Lei
;
Lei-ming Fang
;
Lei Qi
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2019/02/25
neutron powder diffraction
synchrotron x-ray diffraction
TaN
high pressure
Theoretical Investigation of Ta2O5, TaON, and Ta3N5: Electronic Band Structures and Absolute Band Edges
期刊论文
JOURNAL OF PHYSICAL CHEMISTRY C, 2017
Cui, Zhi-Hao
;
Jiang, Hong
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2017/12/03
VISIBLE-LIGHT IRRADIATION
DENSITY-FUNCTIONAL THEORY
BODY PERTURBATION-THEORY
TANTALUM OXYNITRIDE
(OXY)NITRIDE PHOTOCATALYSTS
DERIVATIVE DISCONTINUITIES
NEUTRON-DIFFRACTION
ENERGY CALCULATIONS
OPTICAL-PROPERTIES
CRYSTAL-STRUCTURE
Electrochemical corrosion behavior of Ta2n nanoceramic coating in simulated body fluid (EI收录SCI收录)
期刊论文
Materials, 2016, 卷号: 9, 页码: 772-772
作者:
Cheng, Jian[1]
;
Xu, Jiang[1,2]
;
Liu, Lin Lin[1]
;
Jiang, Shuyun[3]
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2019/04/24
Aluminum
Capacitance measurement
Characterization
Coatings
Corrosion
Corrosion resistance
Electric discharges
Electrochemical corrosion
Electrochemical impedance spectroscopy
Glow discharges
Mechanical properties
Nitrides
Oxide films
Point defects
Polarization
Tantalum
Tantalum oxides
Titanium alloys
Titanium oxides
Wear resistance
X ray photoelectron spectroscopy
Tantalum (oxy)nitrides nanotube arrays for the degradation of atrazine in vis-Fenton-like process
期刊论文
JOURNAL OF HAZARDOUS MATERIALS, 2012, 卷号: 225, 期号: 0, 页码: 21-27
Du, Yingxun
;
Zhao, Lu
;
Chang, Yuguang
;
Su, Yaling
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2013/04/08
Synthesis of gan nanowires with tantalum catalyst by magnetron sputtering
期刊论文
Rare metal materials and engineering, 2009, 卷号: 38, 期号: 7, 页码: 1129-1131
作者:
Xue Chengshan
;
Li Hong
;
Zhuang Huizhao
;
Chen Jinhua
;
Yang Zhaozhu
收藏
  |  
浏览/下载:19/0
  |  
提交时间:2019/05/12
Nanostructures
Nitrides
Sputtering
First Principles Investigation on the Ultra-Incompressible and Hard TaN
期刊论文
journal of computational chemistry, 2009, 卷号: 30, 期号: 14, 页码: 2358-2363
Zhao EJ
;
Hong B
;
Meng J
;
Wu ZJ
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  |  
浏览/下载:11/0
  |  
提交时间:2010/05/04
INITIO MOLECULAR-DYNAMICS
TRANSITION-METAL NITRIDES
TOTAL-ENERGY CALCULATIONS
AUGMENTED-WAVE METHOD
TANTALUM-NITRIDE
ELECTRONIC-STRUCTURE
SUPERHARD MATERIALS
HIGH-PRESSURE
BASIS-SET
TA3N5
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