CORC

浏览/检索结果: 共86条,第1-10条 帮助

已选(0)清除 条数/页:   排序方式:
Method to construct the initial structure of optical systems based on full-field aberration correction 期刊论文
Applied Optics, 2023, 卷号: 62, 期号: 17, 页码: 4571-4582
作者:  X. Chen, X. Zhang, Z. Su, J. Yu and L. Wang
收藏  |  浏览/下载:0/0  |  提交时间:2024/07/01
Study on the characteristics of atomic hydrogen cleaning carbon contamination on multilayers 期刊论文
Vacuum, 2022, 卷号: 196, 页码: 11
作者:  Y. Song;  Q. P. Lu;  X. P. Gong;  D. Z. Wang;  Z. Zhang
收藏  |  浏览/下载:0/0  |  提交时间:2023/06/14
Design of off-axis multi-reflective optical system based on particle swarm optimization 期刊论文
Chinese Optics, 2021, 卷号: 14, 期号: 6, 页码: 1435-1450
作者:  Y. Wu;  L.-P. Wang;  J. Yu;  X. Zhang and C.-S. Jin
收藏  |  浏览/下载:3/0  |  提交时间:2022/06/13
Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers 期刊论文
Guangxue Xuebao/Acta Optica Sinica, 2020, 卷号: 40, 期号: 10, 页码: 7
作者:  S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng
收藏  |  浏览/下载:2/0  |  提交时间:2021/07/06
Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view 期刊论文
Applied Optics, 2020, 卷号: 59, 期号: 32, 页码: 10185-10193
作者:  Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin
收藏  |  浏览/下载:3/0  |  提交时间:2021/07/06
Nonuniform self-imaging of achromatic Talbot lithography 期刊论文
CHINESE OPTICS LETTERS, 2019, 卷号: 17, 期号: 6, 页码: -
作者:  Xia, HJ;  Yang, SM;  Wang, LS;  Zhao, J;  Xue, CF
收藏  |  浏览/下载:14/0  |  提交时间:2020/10/16
Quality evaluation of solar magnetic field images at EUV wavelengths in digital image correlation method 期刊论文
Journal of Computational Methods in Sciences and Engineering, 2019, 卷号: 19, 期号: 4, 页码: 1109-1123
作者:  Y.Liu;  K.-F.Song;  J.-L.Ma;  X.-D.Wang;  Z.-W.Han
收藏  |  浏览/下载:0/0  |  提交时间:2020/08/24
Modeling multilayer coating profiles with defects on EUV collector with grating 期刊论文
Optical Engineering, 2019, 卷号: 58, 期号: 10, 页码: 9
作者:  S.Z.Sun;  C.S.Jin;  B.Yu;  T.Guo;  S.Yao
收藏  |  浏览/下载:5/0  |  提交时间:2020/08/24
Theoretical determination of energies, wavelengths, and transition probabilities for EUV and SXR spectral lines in Rb XXXIV, Sr XXXV, Zr XXXVII, and Nb XXXVIII 期刊论文
Journal of Quantitative Spectroscopy & Radiative Transfer, 2019, 卷号: 225, 期号: 225, 页码: 76-83
作者:  Sang CC(桑萃萃)
收藏  |  浏览/下载:2/0  |  提交时间:2020/11/13
Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography 期刊论文
MACROMOLECULAR MATERIALS AND ENGINEERING, 2018, 卷号: 303, 期号: 6
作者:  Peng, Xiaoman;  Wang, Yafei;  Xu, Jian;  Yuan, Hua;  Wang, Liangqian
收藏  |  浏览/下载:35/0  |  提交时间:2019/04/09


©版权所有 ©2017 CSpace - Powered by CSpace