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Design of off-axis multi-reflective optical system based on particle swarm optimization 期刊论文
Chinese Optics, 2021, 卷号: 14, 期号: 6, 页码: 1435-1450
作者:  Y. Wu;  L.-P. Wang
收藏  |  浏览/下载：3/0  |  提交时间：2022/06/13
Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view 期刊论文
Applied Optics, 2020, 卷号: 59, 期号: 32, 页码: 10185-10193
作者:  Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin
收藏  |  浏览/下载：3/0  |  提交时间：2021/07/06
Plasmonic Interference Lithography for Low-Cost Fabrication of Dense Lines with Sub-50 nm Half-Pitch 期刊论文
ACS Applied Nano Materials, 2019, 卷号: 2, 期号: 1, 页码: 489-496
作者:  Kong, Weijie;  Luo, Yunfei;  Zhao, Chengwei;  Liu, Ling;  Gao, Ping
收藏  |  浏览/下载：9/0  |  提交时间：2021/05/06
Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography 会议论文
Australia, 2019
作者:  N. Nakamura;  E. Kako;  R. Kato;  H. Kawata;  T. Miyajima
收藏  |  浏览/下载：19/0  |  提交时间：2019/08/06
全固态高压脉冲电源在半导体光刻光源中的应用 期刊论文
强激光与粒子束, 2019, 卷号: 031
作者:  游利兵;  程超;  方晓东
收藏  |  浏览/下载：6/0  |  提交时间：2020/11/23
Quality evaluation of solar magnetic field images at EUV wavelengths in digital image correlation method 期刊论文
Journal of Computational Methods in Sciences and Engineering, 2019, 卷号: 19, 期号: 4, 页码: 1109-1123
作者:  Y.Liu;  K.-F.Song;  J.-L.Ma;  X.-D.Wang;  Z.-W.Han
收藏  |  浏览/下载：0/0  |  提交时间：2020/08/24
Modeling multilayer coating profiles with defects on EUV collector with grating 期刊论文
Optical Engineering, 2019, 卷号: 58, 期号: 10, 页码: 9
作者:  S.Z.Sun;  C.S.Jin;  B.Yu;  T.Guo;  S.Yao
收藏  |  浏览/下载：5/0  |  提交时间：2020/08/24
Theoretical determination of energies, wavelengths, and transition probabilities for EUV and SXR spectral lines in Rb XXXIV, Sr XXXV, Zr XXXVII, and Nb XXXVIII 期刊论文
Journal of Quantitative Spectroscopy & Radiative Transfer, 2019, 卷号: 225, 期号: 225, 页码: 76-83
作者:  Sang CC(桑萃萃)
收藏  |  浏览/下载：2/0  |  提交时间：2020/11/13
Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography 期刊论文
MACROMOLECULAR MATERIALS AND ENGINEERING, 2018, 卷号: 303, 期号: 6
作者:  Peng, Xiaoman;  Wang, Yafei;  Xu, Jian;  Yuan, Hua;  Wang, Liangqian
收藏  |  浏览/下载：35/0  |  提交时间：2019/04/09
Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons 期刊论文
OPTICAL MATERIALS EXPRESS, 2018, 卷号: 8, 期号: 2, 页码: 199-209
作者:  Liu, Hongchao;  Luo, Yunfei;  Kong, Weijie;  Liu, Kaipeng;  Du, Wenjuan
收藏  |  浏览/下载：45/0  |  提交时间：2019/08/23

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