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Polarization Aberration of a Non-Rotationally Symmetric Optical System With Freeform Surfaces
期刊论文
Ieee Access, 2021, 卷号: 9, 页码: 145538-145553
作者:
Y. L. Zhang
;
H. D. Shi and H. L. Jiang
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2022/06/13
Fabrication of imitative stress-corrosion cracks for electromagnetic NDE using synchrotron deep x-ray lithography and powder metallurgy processing
会议论文
作者:
Jomdecha, Cherdppong
;
Cai, Wenlu
;
Xie, Shejuan
;
Chen, Zhenmao
;
Phung-On, Isaratat
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  |  
浏览/下载:11/0
  |  
提交时间:2019/11/19
Combined techniques
Deep X-ray lithography
Equivalent conductivity
Imitative SCC
Inversion scheme
Powder metallurgy processing
Pressure filling
Reference specimens
Fabrication of (K,Na)NbO/sub 3/ lead-free piezoceramic microrod arrays by sol-gel processing with micromachined silicon templates
期刊论文
2010, 2010
Ying Xu
;
Dawei Liu
;
Fengping Lai
;
Yuhua Zhen
;
Jing-Feng Li
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  |  
浏览/下载:4/0
Fabrication of (K,Na)NbO3 lead-free piezoceramic microrod arrays by sol-gel processing with micromachined silicon templates
期刊论文
2010, 2010
Xu, Ying
;
Liu, Dawei
;
Lai, Fengping
;
Zhen, Yuhua
;
Li, Jing-Feng
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  |  
浏览/下载:4/0
Theoretical and experimental results of focusing performance for the parabolic compound X-ray refractive lenses
期刊论文
ACTA PHYSICA SINICA, 2010, 卷号: 59, 期号: 3, 页码: 1977-1984
作者:
Le, ZC
;
Dong, W
;
Liu, W
;
Zhang, M
;
Liang, JQ
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  |  
浏览/下载:22/0
  |  
提交时间:2016/06/29
X-ray optics
compound X-ray refractive lens
X-ray focusing
synchrontron radiation
The study on the epoxy resin compound X-ray refractive lens (EI CONFERENCE)
会议论文
ICO20: MEMS, MOEMS, and NEMS, August 21, 2005 - August 26, 2005, Changchun, China
Liang J.
;
Le Z.
;
Peng L.
;
Wang W.
;
Yi F.
;
Quan B.
;
Yao J.
;
Zhang J.
;
Dong W.
;
Xuan M.
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  |  
浏览/下载:18/0
  |  
提交时间:2013/03/25
In this paper
the authors report their resent results of the study on the epoxy resin compound X-ray refractive lens. At the first
the theoretical results of the structure parameters for such a device are given. Then
the fabrication technologies are presented. They are deep soft X-ray lithography
mold-manufacturing and molding. The material of X-ray photoresist is PMMA
the mold is made of silicone rubber
and the material of the lens is epoxy resin. Some measured results by means of optical microscope and SEM are also shown. The structure height of the epoxy resin compound lens is measured to be 500 micrometers.
Synthesis and photoluminescence properties of vertically aligned ZnO nanorod-nanowall junction arrays on a ZnO-coated silicon substrate
期刊论文
nanotechnology, 2006, 卷号: 17, 期号: 15, 页码: 3740-3744
Li C (Li Chun)
;
Fang GJ (Fang Guojia)
;
Su FH (Su Fuhai)
;
Li GH (Li Guohua)
;
Wu XG (Wu Xiaoguang)
;
Zhao XZ (Zhao Xingzhong)
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  |  
浏览/下载:35/0
  |  
提交时间:2010/04/11
TEMPERATURE-DEPENDENT PHOTOLUMINESCENCE
OPTICAL-PROPERTIES
ZINC-OXIDE
THIN-FILMS
VAPOR-DEPOSITION
SI SUBSTRATE
NANOWIRES
GROWTH
EMISSION
EPITAXY
深亚微米X射线光刻模拟软件XLSS1.0
期刊论文
微细加工技术, 2004, 期号: 4, 页码: 27-30+35
作者:
谢常青
;
王德强
;
陈大鹏
;
叶甜春
;
伊福廷
收藏
  |  
浏览/下载:19/0
  |  
提交时间:2015/12/25
X射线光刻
同步辐射
束衍生法
面向对象编程
X-ray lithography technology for the fabrication of deep-submicron T-shaped gate
期刊论文
HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION, 2003, 卷号: 27, 页码: #REF!
作者:
Xie, CQ
;
Chen, DP
;
Li, B
;
Wang, DQ
;
Ye, TC
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  |  
浏览/下载:17/0
  |  
提交时间:2016/04/12
X-ray lithography
X-ray mask
deep-submicron T-shaped gate
blur
New type X-ray mask fabricated using inductively coupled plasma deepetching
期刊论文
microsystem technologies, 2001
Chen, D
;
Lei, W
;
Wang, S
;
Li, C
;
Guo, X
;
Mao, H
;
Zhang, D
;
Yi, F
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2015/11/12
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