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浏览/检索结果: 共7条，第1-7条 帮助 限定条件 发表日期：2020     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Improvement of GaN plasma etching uniformity by optimizing the coil electrode with plasma simulation and experimental validation 期刊论文 SURFACE & COATINGS TECHNOLOGY, 2020, 卷号: 400 作者:  Xiao, Dezhi;  Ruan, Qingdong;  Liu, Liangliang;  Shen, Jie;  Cheng, Cheng 收藏  |  浏览/下载：28/0  |  提交时间：2020/11/26 GaN  Plasma etching  Inductively-coupled plasma  Field coupling  Uniformity  Plasma simulation   Modelling of nanometer scale dust grains in tokamak 期刊论文 CONTRIBUTIONS TO PLASMA PHYSICS, 2020, 卷号: 60 作者:  Liu, Zhuang;  Xiao, Xiaotao;  Xu, Xueqiao;  Li, Nami;  Tang, Tengfei 收藏  |  浏览/下载：22/0  |  提交时间：2020/10/26 BOUT plus plus  Nanodust  plasma simulation  tokamak   Influence of the solenoid magnetic field on the self-modulation mechanism 期刊论文 LASER AND PARTICLE BEAMS, 2020, 卷号: 38, 期号: 2, 页码: 135-140 作者:  Zhao, Xiao-ying;  Yang, Yang-yang;  Jia, Huan;  Xie, Zai-peng;  Qi, Xin 收藏  |  浏览/下载：122/0  |  提交时间：2022/01/12 Particle beams  particle-in-cell simulation  plasma accelerator  self-modulation mechanism  wakefield   Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates 期刊论文 JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267 作者:  Zhang JW(张景文) 收藏  |  浏览/下载：12/0  |  提交时间：2020/11/30 reactive ion etching  capacitive coupled discharge  fluid simulation  discharge parameter  large area SiO2 substrates  plasma radial uniformity   Effects of Ion Energy and Density on the Plasma Etching-Induced Surface Area, Edge Electrical Field, and Multivacancies in MoSe2 Nanosheets for Enhancement of the Hydrogen Evolution Reaction 期刊论文 SMALL, 2020 作者:  Xiao, Dezhi;  Ruan, Qingdong;  Bao, De-Liang;  Luo, Yang;  Huang, Chao 收藏  |  浏览/下载：69/0  |  提交时间：2020/11/26 edge electric field  etched through-holes  hydrogen evolution reaction  multivacancies  plasma simulation  plasma-induced damage   Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates 期刊论文 JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267 作者:  Zhang, Jingwen;  Fan, Bin;  Li, Zhiwei;  Gao, Guohan;  Li, Bincheng 收藏  |  浏览/下载：30/0  |  提交时间：2021/05/11 Reactive Ion Etching  Capacitive Coupled Discharge  Fluid Simulation  Discharge Parameter  Large Area Sio2 Substrates  Plasma Radial Uniformity   Discharge simulation and volt-second consumption analysis during ramp-up on the CFETR tokamak 期刊论文 CHINESE PHYSICS B, 2020, 卷号: 29 作者:  Liu, Cheng-Yue;  Wu, Bin;  Qian, Jin-Ping;  Li, Guo-Qiang;  Hou, Ya-Wei 收藏  |  浏览/下载：15/0  |  提交时间：2020/11/26 plasma current ramp-up  China Fusion Engineering Test Reactor  tokamak simulation code  volt-second consumption