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Enhanced electrochromism in short wavelengths for NiO:(Li, Mg) films in full inorganic device ITO/NiO:(Li, Mg)/Ta2O5/WO3/ITO 期刊论文
ELECTROCHIMICA ACTA, 2018, 卷号: 263, 页码: 277-285
作者:  Dong, Dongmei;  Wang, Wenwen;  Barnabe, Antoine;  Presmanes, Lionel;  Rougier, Aline
收藏  |  浏览/下载:4/0  |  提交时间:2019/12/30
Lithium trapping as a degradation mechanism of the electrochromic properties of all-solid-state WO3//NiO devices 期刊论文
JOURNAL OF MATERIALS CHEMISTRY C, 2018, 卷号: 6, 页码: 9875-9889
作者:  Dong, Dongmei;  Wang, Wenwen;  Rougier, Aline;  Barnabe, Antoine;  Dong, Guobo
收藏  |  浏览/下载:4/0  |  提交时间:2019/12/30
Properties of all-thin-film glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices prepared by magnetron sputtering 期刊论文
THIN SOLID FILMS, 2018, 卷号: 662, 页码: 6-12
作者:  Che, Xiaoqi;  Wu, Zhonghou;  Dong, Guobo;  Diao, Xungang;  Zhou, Yuliang
收藏  |  浏览/下载:10/0  |  提交时间:2019/12/30
Life-cycling and uncovering cation-trapping evidence of a monolithic inorganic electrochromic device: glass/ITO/WO3/LiTaO3/NiO/ITO 期刊论文
NANOSCALE, 2018, 卷号: 10, 页码: 16521-16530
作者:  Dong, Dongmei;  Wang, Wenwen;  Rougier, Aline;  Dong, Guobo;  Da Rocha, Mathias
收藏  |  浏览/下载:6/0  |  提交时间:2019/12/30
Improved performance of co-sputtered Ni-Ti oxide films for all-solid-state electrochromic devices 期刊论文
RSC ADVANCES, 2016, 卷号: 6, 页码: 111148-111160
作者:  Dong, Dongmei;  Wang, Wenwen;  Dong, Guobo;  Zhang, Fan;  Yu, Hang
收藏  |  浏览/下载:9/0  |  提交时间:2019/12/30
Electrochromic properties and performance of NiOx films and their corresponding all-thin-film flexible devices preparedby reactive DC magnetron sputtering 期刊论文
APPLIED SURFACE SCIENCE, 2016, 卷号: 383, 页码: 49-56
作者:  Dong, Dongmei;  Wang, Wenwen;  Dong, Guobo;  Zhang, Fan;  He, Yingchun
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/30
Enhanced transmittance modulation of ITO/NiOx/ZrO2:H/WO3/ITO electrochromic devices 期刊论文
IONICS, 2016, 卷号: 22, 页码: 25-32
作者:  Zhou, Yuliang;  Diao, Xungang;  Dong, Guobo;  Wu, Zhonghou;  Dong, Dongmei
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/30
Electrochromic properties of NiOx:H films deposited by DC magnetron sputtering for ITO/NiOx:H/ZrO2/WO3/ITO device 期刊论文
APPLIED SURFACE SCIENCE, 2015, 卷号: 357, 页码: 799-805
作者:  Dong, Dongmei;  Wang, Wenwen;  Dong, Guobo;  Zhou, Yuliang;  Wu, Zhonghou
收藏  |  浏览/下载:4/0  |  提交时间:2020/01/06


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