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Optimization of HfO2 Growth Pr℃ess by Atomic Layer Deposition (ALD) for High Performance Charge Trapping Flash Memory Application 期刊论文
ECS transactions, 2013
作者:  Liu M(刘明);  Chen GX(陈国星);  Huo ZL(霍宗亮);  Zhao SJ(赵盛杰)
收藏  |  浏览/下载:9/0  |  提交时间:2014/10/22
Effect of Pre-annealing to Blocking Oxide on the Performance of Dual Trapping-layer Engineered Charge Trapping Memory 会议论文
作者:  Huo ZL(霍宗亮);  Liu M(刘明);  Chen GX(陈国星)
收藏  |  浏览/下载:5/0  |  提交时间:2014/10/22


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