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长春光学精密机械与物... [6]
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期刊论文 [3]
学位论文 [2]
会议论文 [1]
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专题:长春光学精密机械与物理研究所
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Scanning ion beam etching: A method for the fabrication of computer-generated hologram with nanometric accuracy for aspherical testing
期刊论文
Optics and Lasers in Engineering, 2021, 卷号: 139
作者:
R. Wang
;
Z. Zhang
;
Y. Bai
;
Y. Wang
;
X. Yin
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浏览/下载:3/0
  |  
提交时间:2022/06/13
High-performance etching of multilevel phase-type Fresnel zone plates with large apertures
期刊论文
Optics Communications, 2018, 卷号: 407, 页码: 227-233
作者:
Guo, C. L.
;
Zhang, Z. Y.
;
Xue, D. L.
;
Li, L. X.
;
Wang, R. Q.
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  |  
浏览/下载:4/0
  |  
提交时间:2019/09/17
Fresnel zone plate
Diffractive optical elements
Etching depth
uniformity
Ion beam etching
Dwell time algorithm
dwell-time algorithm
dielectric gratings
fabrication errors
x-ray
ion
Optics
用于热释电探测器的红外微透镜阵列的设计与制作
学位论文
硕士: 中国科学院大学, 2015
作者:
王萌佳
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浏览/下载:37/0
  |  
提交时间:2015/11/30
热释电探测器
红外微透镜阵列
热回流
大F数微透镜
离子束刻蚀
垂直腔面发射激光器高阶模式及偏振控制
学位论文
博士: 中国科学院大学, 2015
作者:
李秀山
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浏览/下载:94/0
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提交时间:2015/11/30
垂直腔面发射激光器
横向模式
偏振
光场
Rectangular mesa shaped vertical cavity surface emitting laser with shallow surface relief
期刊论文
Zhongguo Jiguang/中文 Journal of Lasers, 2014, 卷号: 41, 期号: 12
Li X.
;
Ning Y.
;
Jia P.
;
Chen Y.
;
Zhang X.
;
Zhang J.
;
Zhang J.
;
Liu Y.
;
Qin L.
;
Wang L.
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浏览/下载:22/0
  |  
提交时间:2015/04/24
Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE)
会议论文
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.
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浏览/下载:20/0
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提交时间:2013/03/25
In ultraviolet spectroscopy
groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore
there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order
it is important to control the groove shape precisely
so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm
especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method
the required blaze angle is small
we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles
and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model
the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides
since the etched groove shape depends on the aspect ratio of the photoresist mask ridge
if we wish to fabricate larger gratings with this method
we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
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