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长春光学精密机械与物... [7]
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期刊论文 [4]
会议论文 [2]
学位论文 [1]
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2019 [3]
2015 [1]
2014 [1]
2012 [1]
2007 [1]
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专题:长春光学精密机械与物理研究所
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Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation
期刊论文
Applied Physics Letters, 2019, 卷号: 114, 期号: 13, 页码: 5
作者:
Y.Z.He
;
J.H.Zhang
;
S.Singh
;
E.Garcell
;
A.Y.Vorobyev
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浏览/下载:0/0
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提交时间:2020/08/24
femtosecond laser,pattern-formation,surface,metals,Physics
Improvement in Light Output of Ultraviolet Light-Emitting Diodes with Patterned Double-Layer ITO by Laser Direct Writing
期刊论文
Nanomaterials, 2019, 卷号: 9, 期号: 2, 页码: 9
作者:
J.Zhao
;
X.H.Ding
;
J.H.Miao
;
J.F.Hu
;
H.Wan
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  |  
浏览/下载:1/0
  |  
提交时间:2020/08/24
UV LEDs,double-layer ITO,pinhole pattern,current spreading,light,output power,thin-films,transparent,electrodes,efficiency,leds,surface,blue,inactivation,enhancement,irradiation,Science & Technology - Other Topics,Materials Science
Fluorescence enhanced lab-on-a-chip patterned using a hybrid technique of femtosecond laser direct writing and anodized aluminum oxide porous nanostructuring
期刊论文
Nanoscale Advances, 2019, 卷号: 1, 期号: 9, 页码: 3474-3484
作者:
Z.Yu
;
Y.Lei
;
W.Yu
;
J.Cheng
;
J.Xing
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  |  
浏览/下载:9/0
  |  
提交时间:2020/08/24
Aluminum oxide,Alumina,Chemical modification,Electrochemical deposition,Energy transfer,Femtosecond lasers,Fluorescence,Hydrophilicity,Lab-on-a-chip,Laser excitation,Molecules,Photoresists,Reduction,Rhodium compounds,Spectral resolution,Superhydrophobicity
扫描干涉场曝光系统干涉条纹测量与调整方法研究
学位论文
博士: 中国科学院大学, 2015
作者:
姜珊
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浏览/下载:101/0
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提交时间:2015/11/30
全息光栅
扫描干涉场曝光系统
曝光对比度
干涉条纹
曝光刻线相位
光栅周期
Fabrication of micro-optical elements on curved substrates by electrostatic induced lithography
期刊论文
Rsc Advances, 2014, 卷号: 4, 期号: 72, 页码: 38379-38383
Li H.
;
Yu W.
;
Wang T.
;
Zhang H.
;
Niu W.
;
Abraham E.
;
Desmulliez M. P. Y.
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  |  
浏览/下载:18/0
  |  
提交时间:2015/04/24
Constant exposure control algorithm for laser direct writing of mesh pattern in a deep concave spherical substrate
会议论文
2012
Liang F. C.
;
Gao J. S.
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  |  
浏览/下载:13/0
  |  
提交时间:2013/03/28
Key techniques of laser direct writing patterns on spherical substrate (EI CONFERENCE)
会议论文
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
Feng X.-G.
;
Zhao J.-L.
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浏览/下载:18/0
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提交时间:2013/03/25
Comparing with the writing method of plane pattern
spherical pattern' has some remarkable different on several points. Firstly
it is difficult to spin-coated a uniform photoresist film on a spherical substrate
especially the ratio of spherical radius to caliber is smaller
and the spin-coated way must match the ratio of spherical radius to caliber. Secondly
if the sphere couldn't be regarded as a plane
a so-called concentric optical scan movement way must be applied for the generation of spherical pattern
because the reflex of substrate will affect the quantity of illumination. Commonly
an alignment technique is indispensable with pattern generation of spherical surface by the concentric optical scan in order to ensure the orthogonal intersection of focusing laser beam and writing surface. Thirdly
a uniform velocity control must be considered for the laser direct writing method on a spherical substrate. Otherwise
the exposure time of photoresist will be different
and the line widths of pattern will be also different at different areas. Fourthly
commonly
because the errors of concentric machine and substrate surface shape are bigger
so focusing servo-control technique is also needful for writing a pattern on a spherical substrate. Focusing servo-control may keep the focal spot on the spherical surface by a focus detection and control system in the course of writing pattern. Using these techniques
we fabricated a line width of 7m and a period of 600m isometric mesh on the concave of a spherical substrate.
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