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浏览/检索结果: 共6条，第1-6条 帮助 限定条件 内容类型：会议论文     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Catalyst-Free CVD Synthesis of ZnO Nanowire Networks on SiO2 Substrate and Its Photoresponse 会议论文 Chongqing, PEOPLES R CHINA, JUL 18-22, 2016 作者:  Xu, Liping;  Lu, Wenqiang;  Zhan, Zhaoyao;  Cui, Hongliang;  Weng, Zhankun 收藏  |  浏览/下载：14/0  |  提交时间：2018/03/15 Catalyst-free CVD synthesis of ZnO nanowire networks on SiO2substrate and its photoresponse 会议论文 Chongqing, China, July 18, 2016 - July 22, 2016 作者:  Xu, Liping;  Lu, Wenqiang;  Zhan, Zhaoyao;  Cui, Hongliang;  Weng, Zhankun 收藏  |  浏览/下载：14/0  |  提交时间：2018/03/16 Large-eddy simulation of pollutant dispersion from a ground-level area source over urban street canyons with irreversible chemical reactions 会议论文 13th EMS Annual Meeting & 11th European Conference on Applications of Meteorology (ECAM), Reading, United Kingdom 作者:  T.Z.Du;  C.-H.Li;  Y.B.Zhao 收藏  |  浏览/下载：10/0  |  提交时间：2015/08/28 Influence of calcination temperature on iron titanate catalyst for the selective catalytic reduction of NOx with NH3 会议论文 1st Joint International Conference of the 8th Tokyo Conference on Advanced Catalytic Science and Technology/5th Asia Pacific Congress on Catalysis, Sapporo, JAPAN, JUL 18-23, 2010 作者:  Liu, Fudong;  Asakura, Kiyotaka;  He, Hong;  Liu, Yongchun;  Shan, Wenpo 收藏  |  浏览/下载：16/0  |  提交时间：2015/12/29 Selective catalytic reduction  Iron titanate catalyst  Calcination temperature  Intrinsic SCR activity  Thermal stability   AlGaN/GaN/InGaN/GaN DH-HEMTs structure with an AlN interlayer grown by MOCVD 会议论文 34th international symposium on compound semiconductors, kyoto, japan, oct 15-18, 2007 Tang, J; Wang, XL; Xiao, HL; Ran, JX; Wang, CM; Wang, XY; Hu, GX; Li, JM 收藏  |  浏览/下载：46/0  |  提交时间：2010/03/09 PERFORMANCE  HETEROSTRUCTURES  OPTIMIZATION  MOBILITY   The study of high temperature annealing of a-SiC : H films 会议论文 3rd international materials symposium/12th meeting of the sociedad-portuguesa-da-materials (materials 2005/spm), aveiro, portugal, mar 20-23, 2005 Zhang, S; Hu, Z; Raniero, L; Liao, X; Ferreira, I; Fortunato, E; Vilarinho, P; Perreira, L; Martins, R 收藏  |  浏览/下载：209/71  |  提交时间：2010/03/29 silicon carbide  high temperature annealing  thin film  SILICON  PECVD