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Multi-Diagnostic Transverse Profile Monitor Chamber for Extreme Ultraviolet Lithography 会议论文
Proceedings of the 4th International Beam Instrumentation Conference, Australia, 2015
作者:  T.J.Campese;  R.B.Agustsson;  M.A.Harrison;  B.T.Jacobson;  A.Y.Murokh
收藏  |  浏览/下载：13/0  |  提交时间：2016/06/14
Calibration of system errors in lateral shearing interferometer for EUV-wavefront metrology 会议论文
conference on extreme ultraviolet (euv) lithography vi
作者:  Li, Jie;  Tang, Feng;  Wang, Xiangzhao;  Dai, Fengzhao;  Wu, Feibin
收藏  |  浏览/下载：12/0  |  提交时间：2016/11/28
Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography 会议论文
conference on extreme ultraviolet (euv) lithography v
作者:  Liu, Xiaolei;  Wang, Xiangzhao;  Li, Sikun;  Yan, Guanyong;  Erdmann, Andreas
收藏  |  浏览/下载：12/0  |  提交时间：2016/11/28
ANALYSIS OF PARAMETER SPACE OF A KILOWATT-SCALE FREE ELECTRON LASER FOR EXTREME ULTRAVIOLET LITHOGRAPHY DRIVEN BY L-BAND SUPERCONDUCTING LINEAR ACCELERATOR OPERATING IN A BURST MODE 会议论文
Proceedings of the second International Particle Accelerator Conference (IPAC 2011), Spain, 2011
作者:  E.Schneidmiller;  V.Vogel;  H.Weise;  M.V.Yurkov
收藏  |  浏览/下载：17/0  |  提交时间：2016/06/21
A 3D numerical study of pinhole diffraction in Visible-light point diffraction interferometry 会议论文
Proc. of SPIE, 2011
作者:  Tingwen Xing;  Jiajun Xun;  Fuchao Xu
收藏  |  浏览/下载：9/0  |  提交时间：2016/11/23
Analysis of measuring errors for the visible light phase-shifting point diffraction interferometer (EI CONFERENCE) 会议论文
2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010, December 3, 2010 - December 6, 2010, Guangzhou, China
Zhang Y.; Jin C.; Lu Z.
收藏  |  浏览/下载：10/0  |  提交时间：2013/03/25
In order to improve the measuring accuracy of the visible light phase-shifting point diffraction interferometer (PS/PDI) for the extreme ultraviolet lithography (EUVL) aspheric mirrors  the main measuring errors will be discussed in this paper. At first  the elementary configuration and measuring principle of the visible light phase-shifting point diffraction interferometer are introduced briefly  then the different errors which are possible to affect the measuring result are summed up  the errors include PZT phase-shifting error  detector nonlinearity error  detector quantization error  wavelength instability error and intensity instability error of the laser source  vibration error  air refractivity instability error and so on. Through detailed analysis and simulation  the magnitude of these errors can be obtained. By analysing the reasons which cause these errors and the relationship between these errors and interferometer configuration parameters  some methods are put forward to avoid or restrain these errors accordingly.  
Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas 会议论文
作者:  Zhao, H. Y.;  Zhao, H. W.;  Sun, L. T.;  Zhang, X. Z.;  Wang, H.
收藏  |  浏览/下载：12/0  |  提交时间：2018/08/20
Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas 会议论文
作者:  Zhao, H. Y.;  Zhao, H. W.;  Sun, L. T.;  Zhang, X. Z.;  Wang, H.
收藏  |  浏览/下载：10/0  |  提交时间：2018/08/20
Analysis and Control of Thin Film Stresses during Extreme Ultraviolet Lithography Mask Blank Fabrication (CPCI-S收录) 会议论文
HOLOGRAPHY, DIFFRACTIVE OPTICS, AND APPLICATIONS IV
作者:  Zheng, Liang
收藏  |  浏览/下载：1/0  |  提交时间：2019/04/16
Investigation and Prediction of Image Placement Errors in Extreme Ultraviolet Lithography Masks (CPCI-S收录) 会议论文
HOLOGRAPHY, DIFFRACTIVE OPTICS, AND APPLICATIONS IV
作者:  Zheng, Liang
收藏  |  浏览/下载：0/0  |  提交时间：2019/04/16

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